Canon Kabushiki Kaisha

Nec Corporation

Dai Nippon Insatsu Kabushiki Kaisha

Sortec Corporation

Okayama University

Jgc Catalysts & Chemicals Ltd.

Kuraray Noritake Dental Inc.

Koichi Okada

Toshihiko Tanaka

Seiichi Nishikawa

Teruaki Shiro

Hiroshige Ishino

An image distribution apparatus obtains a plurality of images generated by a plurality of image capture apparatuses capturing images of a predetermined subject from different directions, transmits the plurality of images to the plurality of display apparatuses, receives, from the plurality of display apparatuses, viewed image information regarding an image being displayed/reproduced in the plurality of display apparatuses, calculates a degree of attention for each of the image capture apparatuses capturing the images, based on the viewed image information, and transmits, to each of the image capture apparatuses, notification control information for causing a notification unit of the image capture apparatus, the notification unit being disposed in the same orientation as a lens unit of the image capture apparatus, to give notification based on the degree of attention.

Image distribution apparatus, display apparatus, image capture apparatus, and control method

X-ray alignment method and apparatus therefor characterized by separately irradiating alignment light to alignment patterns of an X-ray mask and detecting reflected light therefrom, and directly irradiating alignment light to alignment patterns of a wafer and detecting the reflected light therefrom, and aligning the X-ray mask and the wafer in accordance with the detecting data of the reflected light. The apparatus includes a position alignment mechanism for the mask stage and the wafer stage, which moves the X-ray mask and/or the wafer and provides the alignment therebetween. The apparatus includes independent light sources for irradiating the alignment patterns of the X-ray mask side and the wafer side, independent detectors for detecting the reflected light of the alignment patterns of the X-ray mask and the wafer, and a controller for analyzing the respective positions of the X-ray mask and the wafer in accordance with the detection data and issuing control signals to the position alignment mechanism. The X-ray mask used in the alignment method and apparatus is transparent to only X-rays.

X-ray mask alignment method and apparatus therefor as well as X-ray mask

IC card processing method and processing device therefor, and IC card

A method of lithography employing an electromagnetic wave having a very short wave length such as X-ray and a resist layer sensitive to that electromagnetic wave is disclosed. The irradiation process is divided into two steps. One step is selectively irradiating the electromagnetic wave, as in the prior art, to the resist layer in a desired pattern. The other steps is non-selective irradiation over the entire area of the resist layer. The latter step may be conducted with a plurality of workpieces such as semiconductor wafers simultaneously.

Method of X-ray lithography

Growing community of inventors

Tokyo, Japan

Koichi Okada