Sumitomo Electric Industries, Limited

Kyocera Document Solutions Inc.

Nippon Paint Compnay, Ltd.

Sumitomo Metal Industries, Inc.

Koichi Kimura

Akira Mikumo

Shigenobu Sakita

Daisuke Shimao

Masuhiro Natsuhara

Katsuhiro Itakura

Masatoshi Kuroda

Kenji Shinma

Satoshi Ikeda

Hisao Tokoro

Mitsuru Shinohara

Masakazu Sakaguchi

Nobukazu Suzuki

Haruhiko Sawada

Kazuto Misu

Hisataka Yamamoto

Toshiaki Shiota

Masanori Taguchi

Yoshiyuki Ishibashi

Ryoji Ishihara

Yasushi Hosoda

Taketosi Odawa

Seiya Fujimoto

Kazutoshi Sasaki

An image forming apparatus includes a supply control portion and a setting processing portion. The supply control portion makes a switch between a first mode for supplying developer from a developer container attached to a specific attachment portion that is one of a plurality of attachment portions to which a plurality of developer containers corresponding to developer of a same color can be attached and a second mode for supplying the developer from the plurality of developer containers attached to the plurality of attachment portions sequentially or in parallel. The setting processing portion sets the specific attachment portion based on a user operation.

Image forming apparatus capable of enhancing convenience of image forming apparatus to which plurality of developer containers corresponding to developer of same color can be attached, and image forming method

A heater includes a base having a first surface and a second surface, and a heat generator disposed on a third surface of the base, the third surface being parallel to the first surface. The base includes a hole portion that opens in at least the second surface. The third surface includes a plurality of blank areas on each of which the heat generator is not present and each of which is circular. The blank areas include a first blank area including a region that the hole portion overlaps and a second blank area that does not include a region that the hole portion overlaps.

Heater

A wafer holder includes a mounting table that has a mounting surface for a workpiece at a top, a supporting member that supports the mounting table from a lower side, a first cylindrical member one end of which is joined hermetically to a lower surface of the mounting table, and a second cylindrical member that is provided inside the first cylindrical member and one end of which is joined hermetically to the lower surface of the mounting table.

Semiconductor manufacturing apparatus and wafer holding table for semiconductor manufacturing apparatus

A wafer holding unit includes a disk-shaped ceramic substrate having a wafer mounting surface on an upper surface of the substrate, an RF electrode, for example, embedded within the substrate, a metal terminal inserted from a lower surface of the substrate, and a connecting terminal which electrically connects the RF electrode and the metal terminal with each other. The connecting terminal is constituted by a ceramic member and a metal layer. The ceramic member is made of the same material as the substrate and preferably has a truncated conical shape. The metal layer covers a surface of the ceramic member. An upper end of the metal layer is connected to the RF electrode, while a lower end of the metal layer is connected to the metal terminal with a metal member interposed therebetween.

Wafer holding body

A wafer holder comprising: a ceramic base having a wafer-mounting surface as an upper surface; and a conductive member embedded in the ceramic base, the conductive member including a circuit portion provided parallel to the wafer-mounting surface, a pull-out portion provided parallel to the wafer-mounting surface and spaced from the circuit portion in a direction opposite to a direction toward the wafer-mounting surface, and a connecting portion configured to electrically connect the circuit portion and the pull-out portion to each other.

Wafer holder

A showerhead provided in a chamber of a semiconductor manufacturing apparatus and facing a wafer holder includes: a disk-shaped member having a plurality of through holes penetrating the disk-shaped member in a direction of a thickness thereof; a high-frequency conductor embedded in the disk-shaped member; a hole provided in the disk-shaped member, extending in the direction of the thickness of the disk-shaped member and having a bottom exposing a portion of the conductor; an electrode terminal portion disposed in the hole and having a base portion electrically connected to the conductor and a columnar portion provided on the base portion; a cylindrical member having a first end portion fitted outside the columnar portion and facing the conductor and a second end portion facing away from the first end portion, and a sealing member surrounding the first end portion.

Showerhead and method for manufacturing the same

A showerhead provided in a chamber of a semiconductor manufacturing apparatus and facing a wafer holder includes: a plate-shaped ceramic substrate; a plurality of through holes penetrating the ceramic substrate in the direction of the thickness of the ceramic substrate; and a plurality of radio frequency conductors embedded in a plurality of zones, respectively, of the ceramic substrate, as seen on the side of a surface of the ceramic substrate facing the wafer holder.

Showerhead

Wafer holding unit

In an image processing apparatus, a memory area management portion generates a descriptor for a block storage area allocated in each of a first work memory and a second work memory, and generates sub-band management data associated with the descriptor for the block storage area in which compressed sub-band data is stored, sequentially according to arrangement of the sub-band data in the primary scanning direction and the secondary scanning direction in image data. A data loading portion changes, according to a rotation angle, the association between the sub-band management data and the descriptor after the compressed sub-band data is stored in the second work memory. A decompression processing portion performs rotating process in the sub-band data according to the rotation angle.

Image processing apparatus with memory area management portion

A hemispherical Luneberg dielectric lens including a hemispherical center layer having a hemispherical outer surface, and a plurality of hemispherical dome-shaped layers each having concentric hemispherical inner and outer surfaces, the outer surfaces of the center layer and dome-shaped layers having different diameters and the inner surfaces of said dome-shaped layers having different diameters. The center layer and dome-shaped layers are successively concentrically fitted into one another and integrated into a hemispherical shape. The center layer is a foam molding of ceramic-containing thermoplastic resin expanded beads, while each of said dome-shaped layers is a foam molding of thermoplastic resin expanded beads containing 0 to 80% by weight of a ceramic. The ceramic content per unit volume of the center and dome-shaped layers decreases from the center layer to the outermost dome-shaped layer, and the standard deviation of the apparent density of each of the center and dome-shaped layers is 0.07 g/cm3 or lower.

Luneberg dielectric lens and method of producing same

In a radio wave lens antenna, a lens cover for covering the surface of the lens is stably fixed to the reflector. The antenna has a semispherical Luneberg lens, a semispherical shell-shaped lens cover for covering the surface of the lens, a radio wave reflector, a ring-shaped plate placed along the outer circumference of the lens, a primary feed placed at the focal point of the lens, and a holding part for the primary feed. A flange provided at the opening edge of the lens cover is clamped by the reflector and the plate to fix the lens cover to the reflector, and more preferably, the lens cover is caused to be in contact with the lens, and the lens is pressed also in the radial direction by the plate via the lens cover.

Radio wave lens antenna apparatus

An anticorrosive primer composition comprises (1) 100 parts by weight of an epoxy resin having a number-average molecular weight of from 500 to 10,000, (2) from 10 to 60 parts by weight of an aromatic polyamine containing from 2% to 30% by weight, based on the aromatic polyamine, of a promoter selected from the group consisting of phenol compounds and cresol compounds, (3) from 10 to 60 parts by weight of a polyisocyanate, (4) from 10 to 40 phr, based on the sum of components (1), (2), and (3), of silica particles of colloidal silica or fumed silica or a mixture of these, (5) from 0.5 to 5 phr of a lubricant, and (6) an organic solvent. The composition is particularly suitable for use to apply onto the chromate coating of a chromated, zinc-plated steel sheet.

Anticorrosive primer composition

A polyester coating composition comprising:

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Itami, Japan

Koichi Kimura