Asahi Glass Company, Limited

Koichi Kanda

Tamotsu Morimoto

Susumu Nakagama

Kimihiko Sato

Noritoshi Horie

Hideaki Miyazawa

Masahiro Fusen

Masato Kawasaki

Makoto Hiramoto

Takehiko Kori

Keiichi Hamazaki

Kazuhiro Mitamura

Provided is an electroconductive laminate having a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having an oxide layer and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of at least 1); the oxide layer predominantly contains zinc oxide and titanium oxide having a refractive index of at least 2.3; the oxide layer has an atomic ratio of titanium to a total amount of titanium and zinc of 15-50 atomic %; and the metal layer predominantly contains silver or a silver alloy. Also provided is a process for producing the electroconductive laminate.

Electroconductive laminate, and electromagnetic wave shielding film and protective plate for plasma display

To provide an electroconductive laminate excellent in electrical conductivity and visible light transparency, an electromagnetic wave shielding film for a plasma display, and a protective plate for a plasma display having excellent electromagnetic wave shielding properties, a broad transmission/reflection band and a high visible light transmittance. An electroconductive laminatecomprising a substrate, and an electroconductive filmhaving a three-layer structure having a first oxide layer, a metal layerand a second oxide layerlaminated sequentially from the substrateside, or having a 3&#xd7;n layer structure (wherein n is an integer of at least 2) having the above three-layer structure repeated, wherein the first oxide layercontains 'zinc oxide' and 'titanium oxide or niobium oxide', the metal layeris a layer containing silver, and the second oxide layercontains a mixture of zinc oxide and aluminum oxide, or the like.

Electroconductive laminate, and electromagnetic wave shielding film for plasma display and protective plate for plasma display

A forging die has an inner cylinder of a hard material which is composed of 8-40 vol. % of a metal phase including Ni and Mo as major components and the remaining amount of a ceramic phase including Mo.sub.2 NiB.sub.2 and/or (Mo, W).sub.2 NiB.sub.2, and an outer cylinder of metal, wherein the outer periphery of the inner cylinder is in a state of interference fit to the outer cylinder.

Forging die

Growing community of inventors

Takasago, Japan

Koichi Kanda