Rigaku Corporation

Koichi Kajiyoshi

Takuto Sakumura

Yasukazu Nakaye

Shintaro Kobayashi

Kazuyuki Matsushita

Toru Mitsunaga

Yuji Tsuji

Takeyoshi Taguchi

Yoshinori Ueji

Kazuki Ito

Kunio Nishi

Satoshi Mikusu

Kazuyoshi Arai

Provided are a data processing apparatus a method of obtaining the characteristic of each pixel and a method of data processing, and a program. A data processing apparatusto correct X-ray intensity data measured by a pixel detector includes a characteristic storage unitto store the characteristic of each pixel in a specific detector, a correction table generation unitto apply a measurement condition input as that in measurement by a specific detector and a value expressing the characteristic of each pixel to an approximate formula expressing the count value of each pixel and to generate a correction table for the specific detector using the calculation result of the approximate formula, and a correction unitto correct the X-ray intensity data measured by the specific detector using the generated correction table.

Data processing apparatus, method of obtaining characteristic of each pixel and method of data processing, and program

An image processing method and an image processing apparatus which remove the effects of cosmic rays, noise and defective pixels without losing data in a specified time and which can correct image data efficiently and with high accuracy are provided. An image processing method of performing correction processing on an abnormal value of X-ray image data is provided which includes the steps of: (S) determining whether or not there exists a target element with intensity significantly different from intensity of peripheral elements, in a three dimensional space formed with a space axis and a time axis defined by a series of captured image frames; and (S) replacing the intensity of the target element with a replacement value calculated from the intensity of peripheral elements.

Image processing method and image processing apparatus

There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stage with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.

X-ray diffraction apparatus and method of measuring X-ray diffraction

An X-ray analysis apparatus converts an X-ray intensity distribution of discrete data determined for each pixel, from a first plane where the distribution is known into a second plane where the distribution is not known. The X-ray analysis apparatus projects onto the second plane, a grid point which specifies a pixel on the first plane and an intermediate point between the grid points, as nodes, calculates an area of a region where a polygon expressing a projected pixel specified by the projected nodes overlaps with each pixel on the second plane, to thereby calculate an occupancy ratio of the polygon expressing the projected pixel to each pixel on the second plane and distributes X-ray intensity in the pixel on the first plane to the pixel on the second plane based on the occupancy ratio, to thereby convert the X-ray intensity distribution.

X-ray analysis apparatus, X-ray analysis system, X-ray analysis method, and X-ray analysis program

Growing community of inventors

Ome, Japan

Koichi Kajiyoshi