V Technology Co., Ltd.

Koichi Kajimaya

Michinobu Mizumura

Makoto Hatanaka

The present invention relates to an exposure device which forms an image of a pattern on a mask onto a substrate with microlens arrays to expose the substrate, and reduces a size of an lighting unit which emits an exposure light. Microlens arrays include plural microlenses which are arranged two-dimensionally and arranged in a direction intersecting a movement direction. Lighting unit includes an LD array bar in which plural laser diodes are arranged, and lighting optical system which transforms plural emitted lights emitted from the plural laser diodes into an exposure flux having a slit form. The slit form spreads across plural pieces of the microlenses, and which, with respect to the movement direction, is limited in an area not reaching a microlens arranged in an adjacent row in the movement direction, and illuminates plural microlenses arranged in a row with an exposure light by the exposure light flux.

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Yokohama, Japan

Koichi Kajimaya