Tdk Corporation

Oval Corporation

Kohji Takahashi

Kohji Toda

Yasuo Niwa

Naoki Matsubara

Kenichi Takai

Shinji Oda

A multi-vortex flowmeter includes a vortex type detection device including a measurement tube provided in a flow channel to allow a fluid to be measured to pass, a vortex generator provided in the measurement tube to face a flow of the fluid to be measured, and a vortex detector for detecting a change based on a Karman vortex generated by the vortex generator. The flowmeter also includes a thermal type detection device including a temperature sensor and a heating temperature sensor, each protruding into the flow channel, and a flow rate converter, in which a pressure gauge for measuring a pressure in a pipe wired together with the vortex detector and the thermal detection device is provided integrally with the flow rate converter.

Multi-vortex flowmeter integrating pressure gauge

A multi-vortex flowmeter includes a vortex flowmeter for measurement by volume flow rate and a thermal flowmeter for measurement by mass flow rate to selectively use the two flowmeters according to the flow rate of fluid to be measured flowing through a flow channel. The multi-vortex flowmeter has a switching point between two flowmeters based on the mass flow rate. A mass flow rate Qm at the switching point in a range larger than the minimum flow rate of a vortex flowmeter and smaller than the maximum flow rate of a thermal flowmeter is determined by: Qm=K3*&#x221a;P. Alternatively, a volume flow rate Q at the switching point in a range larger than the minimum flow rate of a vortex flowmeter and smaller than the maximum flow rate of a thermal flowmeter is determined by: Q=K1/&#x221a;P.

Multi-vortex flowmeter employing volume flow rate as switching point

A method of manufacturing a photoelectric conversion device, comprising: forming a thin film of a substance containing PbO and Cr.sub.2 O.sub.3 in a vacuum by an electron beam evaporation process using the substance as a target; and subjecting the thin film to heat treatment in an atmosphere containing at least Pb.

Method of manufacturing a photoelectric conversion device

A photoelectric conversion device in which a thin crystalline Pb--Cr oxide film is formed on the surface of a substrate and a pair of spaced apart conductive film electrodes are formed on the thin film. The thin crystalline Pb--Cr oxide film is formed by a vacuum evaporation process using a sintered body prepared from PbO and Cr.sub.2 O.sub.3 as a target and heat treating the thin film in an atmosphere containing Pb.

Growing community of inventors

Tokyo, Japan

Kohji Takahashi