Toppan Printing Co., Ltd.

Fuji Jukogyo Kabushiki Kaisha

Sharp Kabushiki Kaisha Corporation

The University of Tokyo

Kohei Matsui

Ryosuke Yasui

Nobuo Ando

Shinichi Tasaki

Yukinori Hato

Atsuro Shirakami

Mitsuru Nagai

Kaoru Hatta

Kenji Kojima

Hiromoto Taguchi

Osamu Hatozaki

Risa Takahata

Takeshi Ikeda

Keiichi Tanaka

Takenori Yoshizawa

Yusuke Iida

Genki Harada

Hideyo Tanaka

Yasuhiro Shibata

Kenzo Hirose

Daisuke Asanuma

Kenro Sunahara

Risa Miyagawa

Rieko Tanaka

Eishi Aoki

Isao Shigemori

Morihide Miyamura

Toshio Waku

A fluorescent probe for calcium ion detection that has an excellent photofading resistance and quick Cadetection kinetics and can be localized at an arbitrary site in a cell is provided. The fluorescent probe contains a compound represented by the following general formula (I) or a salt thereof:  A method for detecting intracellular calcium ions including (a) introducing the compound above or a salt thereof into a cell and (b) measuring the fluorescence emitted by the compound or a salt thereof in the cell is also provided.

Taggable fluorescent probe for calcium ion detection

An exposure method for color filter substrate is provided. As shown in FIG.(), exposure is performed while a substrateto which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layersand layersin first non-display regions(regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate. Next, as shown in (b), the substrateis rotated by 90 degrees, and exposure is performed while the substrateis being transported in the X direction, to form second layersin second non-display regions(regions indicated by hatching sloping upward to the right). Thus, dummy PSsand dummy PSsarranged with desired pitches and having desired shapes can be formed in the first non-display regionsand the second non-display regions, respectively.

Exposure method for color filter substrate

An exposure method is provided. In (a) of FIG., exposure is performed while a substrateis being transported in the Y direction, to simultaneously form first layersand layersin first non-display regionsand the display region, respectively, on the substrate. Next, in (b) of FIG., the substrateis rotated by 90 degrees, and exposure is performed while the substrateis being transported in the X direction, to form second layersin second non-display regions. Subsequently, in (c) of FIG., proximity exposure is performed once on the substrateto simultaneously form third layerson the first layersin the first non-display regions, fourth layerson the second layersin the second non-display regions, and layersin the display region

A color filter having excellent display quality is provided by a continuous exposure method using a compact photomask. The color filter includes: a substrate; a black matrix formed on the substrate, for dividing the substrate into rectangular display regions in which the plurality of pixels are arrayed, and non-display regions surrounding the display regions; a stripe pattern; a plurality of columnar spacers disposed in the display regions; and a plurality of dummy columnar spacers. The stripe pattern includes a plurality of colored layers extending in one direction. Each colored layer intersects with a pair of sides of the display region in a direction perpendicular to the direction in which the colored layers extend. The thickness of both end portions of each colored layer disposed on the non-display region is not uniform. The dummy columnar spacers are disposed in portions of the non-display regions, where the colored layers are absent.

Color filter and color filter manufacturing method

In an exposure method, a photomask and a substrate having a resist applied thereto are positioned so as to be opposed to a blinking light source that repeatedly emits light and emits no light. The blinking light source is caused to blink with the substrate being continuously conveyed in a direction orthogonal to a direction in which openings in the photomask are aligned, so that multiple exposures are intermittently performed. In each exposure, a speed at which the substrate is conveyed is controlled such that the openings of the photomask overlap a portion of exposed patterns having been obtained by an immediately preceding exposure, thereby obtaining colored layers which are formed into a striped-shape and extend in the direction in which the substrate is conveyed.

Exposure method and exposure device

A color filter substrate is provided that allows the realization of a liquid crystal display device having excellent display quality and generating no noticeable display unevenness. On a color filter substrate, a lattice-shaped black matrix is formed, and a plurality of colored pixels are formed in matrix. The maximum value of the differences between the overlap widths Wa (or Wb) in the row direction between first colored layers and the black matrix in an area exposed through a photomask, and the overlap widths Wg (or Wh) in the row direction between second colored layers and the black matrix in an area exposed through another photomask, is 4 &#x3bc;m or less. Further, the maximum value of overlap widths Wa to Wl in the row direction between all of the colored pixels and the black matrix is 8 &#x3bc;m or less.

Color filter substrate, display device, and exposure method

A liquid crystal display device is provided which prevents variation in display from being caused due to misalignment of positions of exposure heads and/or error in assembly, and which is excellent in display quality. A liquid crystal display deviceincludes: a color filterand a TFT substratewhich are bonded so as to oppose each other; and liquid crystal (not shown) sealed in a space formed therebetween. The color filterincludes: a substrate; black matrixesprovided on the substrate; and a plurality of colored layersandwhich partially overlap the black matrixesat each pixel position. Vertices of ridgesandformed by the colored layersandoverlapping the black matrixare positioned in an area where upper edgesand, respectively, which continue in the Y-axis direction, are shielded from light by a light shielding sectionof the TFT substrate

Liquid crystal display device

A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the blind shutter which are parallel to the Y axis are each positioned so as to be distant by 500 &#x3bc;m to 1000 &#x3bc;m from a side which forms the outer circumference of the outermost opening and which is closest to the frame area extending in the Y-axis direction. Next, photo spacers are formed on the colored layer such that the central axis of each photo spacer is positioned in a range of positions that are distant by 300 &#x3bc;m or less from a side which is closest to the frame area extending in the Y-axis direction.

Color filter, liquid crystal display device, and color filter production method

An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.

Exposure method, color filter manufacturing method, and exposure device

A color filter which is able to form a liquid crystal display device that has few variation in display caused due to difference in exposure illuminance among exposure heads and/or misalignment in pattern position, and that is excellent in display quality, and an exposure mask used for producing the color filter are provided. A color filterincludes: a substrate; black matrixesprovided on the substrate; and a plurality of colored layerswhich partially overlap the black matrixesin at least a first direction. The widths of overlap portionsin which the black matrixesand the colored layersoverlap each other in the first direction are varied over the entirety of a display area, and the degree of the variation is uniformly distributed over the entirety of the display area. As a result, even if the sizes of the overlap portionsare partially varied due to misalignment in position of the exposure heads and/or change of exposure condition, the partial variation is blended into the variation of the widths distributed over the entirety of the display area, so that a varied state can be prevented from becoming conspicuous as a whole.

Color filter and liquid crystal display device, and exposure mask

A method of manufacturing a color filter, includes forming a colored coated film on a substrate using a colored composition containing a pigment, a monomer having an ethylenic unsaturated double bond and photo-polymerization initiator, irradiating a filter segment-forming region or a black matrix-forming region of the colored coated film with an excimer laser beam having a wavelength of 308 nm (XeCL) at a dosage sufficient to achieve a cumulative light exposure of 1-150 mJ/cm, thereby curing the irradiated region, removing uncured portions of the colored coated film to form the filter segment or the black matrix, and repeating the above-described steps plural times, thereby forming filter segments of at least two colors and/or a black matrix.

Colored composition, color filter and manufacturing method thereof

A lithium ion capacitor includes a positive electrode, a negative electrode, and a non-protonic organic solvent electrolytic solution of a lithium salt. A positive electrode active material is a material capable of reversibly doping a lithium ion and/or an anion. A negative electrode active material is a material capable of reversibly doping a lithium ion. The lithium ion is doped in advance to either one or both of the negative electrode and the positive electrode so that a positive electrode potential after the positive electrode and the negative electrode are short-circuited is 2.0 V (relative to Li/Li) or less when capacitance per unit weight of the positive electrode is C(F/g), weight of the positive electrode active material is W(g), capacitance per unit weight of negative electrode is C(F/g), and weight of the negative electrode active material is W(g), a value of (C&#xd7;W)/(C&#xd7;W) is 5 or more.

Lithium ion capacitor

A lithium ion capacitor includes a positive electrode made of a material capable of reversibly carrying either one or both of a lithium ion and an anion, a negative electrode made of a material capable of reversibly carrying a lithium ion, and an electrolytic solution made of a non-protonic organic solvent electrolytic solution of a lithium salt. A negative electrode active material is non-graphitizable carbon having a ratio of number of hydrogen atoms to number of carbon atoms of zero or more and less than 0.05. The lithium ion is doped in advance to either one or both of the negative electrode and the positive electrode so that a negative electrode potential when a cell is discharged to a voltage one half a charging voltage of the cell is 0.15 V or less relative to a lithium ion potential.

A lithium ion capacitor having high energy density, high output density, high capacity and high safety includes a positive electrode made of a material capable of being reversibly doped with lithium ions and/or anions, a negative electrode made of a material capable of being reversively doped with lithium ions, and an aprotic organic solution of a lithium salt as an electrolytic solution. Wherein, the positive electrode and the negative electrode are laminated or wound with a separator interposed between them, the area of the positive electrode is smaller than the area of the negative electrode. The face of the positive electrode is substantially covered by the face of the negative electrode when they are laminated or wound.

A lithium ion capacitor having a high capacity retention at the time of continuous charge at a high temperature and excellent durability. The lithium ion capacitor includes a positive electrode, a negative electrode and an aprotic organic solvent electrolyte solution of a lithium salt as an electrolytic solution. The positive electrode active material is a material capable of reversibly supporting lithium ions and/or anions, a negative electrode active material is a material capable of reversibly supporting lithium ions, the negative electrode and/or the positive electrode is doped with lithium ions so that the potential of the positive electrode is at most 2.0 V after the positive electrode and the negative electrode are short-circuited, and the electrolytic solution contains vinylene carbonate or its derivative.

Growing community of inventors

Tokyo, Japan

Kohei Matsui