Asml Netherlands B.v.

Koen Steffens

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Paulus Martinus Maria Liebregts

Michel Riepen

Ruud Hendrikus Martinus Johannes Bloks

Gert-Jan Gerardus Johannes Thomas Brands

Raymond Wilhelmus Louis Lafarre

Marco Koert Stavenga

Sergei Shulepov

Thibault Simon Mathieu Laurent

David Bessems

Theodorus Wilhelmus Polet

Daniel Jozef Maria Direcks

Paul Petrus Joannes Berkvens

Nicolaas Rudolf Kemper

Franciscus Johannes Joseph Janssen

Marcio Alexandre Cano Miranda

Gerben Pieterse

Takeshi Kaneko

Gregory Martin Mason Corcoran

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Samuel Bertrand Dominique David

Mathieus Anna Karel Van Lierop

Joris Johan Anne-Marie Verstraete

Matheus Anna Karel Van Lierop

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Erik Henricus Egidius Catharina Eummelen

Johan Gertrudis Cornelis Kunnen

Robbert Jan Voogd

Danny Maria Hubertus Philips

Bastiaan Andreas Wilhelmus Hubertus Knarren

Gerardus Adrianus Antonius Maria Kusters

Ramin Badie

Daniël Jozef Maria Direcks

Christiaan Alexander Hoogendam

Joost Jeroen Ottens

Marcel Beckers

Martijn Houben

Rogier Hendrikus Magdalena Cortie

Siegfried Alexander Tromp

Jim Vincent Overkamp

Anthonie Kuijper

Eva Mondt

Clemens Johannes Gerardus Van Den Dungen

Marco Polizzi

Adrianes Johannes Baeten

Van Vuong Vy

Anca Mihaela Antonevici

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Martinus Hendrikus Antonius Leenders

Theodorus Marinus Modderman

Cornelius Maria Rops

Richard Moerman

Jan Willem Cromwijk

Bart Smeets

Willem Jan Bouman

Arnold Jan Van Putten

Erik Roelof Loopstra

Roelof Frederik De Graaf

Marinus Jochemsen

Marco Baragona

Laurentius Johannes Adrianus Van Bokhoven

Jeroen Gerard Gosen

Pieter Mulder

Koen Cuypers

Fabrizio Evangelista

Henricus Jozef Castelijns

Hrishikesh Patel

Paul William Scholtes-Van Eijk

Jacob Marinus Jan Den Toonder

Pieter Lein Joseph Gunter

Johannes Jacobs

Menno Fien

Marcus Johannes Van Der Zanden

Hua Li

Maikel Adrianus Cornelis Schepers

Albert Johannes Maria Jansen

Francis Fahrni

Erik Witberg

Tijmen Wilfred Mathijs Gunther

Ralph Joseph Meijers

Johanna Antoinette Maria Sondag-Huethorst

Robertus Leonardus Maria In 't Groen

Rogier Cortie

Milica Kovacevic-Milivojevic

Ralph Theodorus Hubertus Maessen

Gert-Jan Geradus Johannes Thomas Brands

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

Thibault Laurent

Ruud Bloks

Han Lempens

Wilhelmus Simons

Raymond Lafarre

A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

Substrate table, immersion lithographic apparatus and device manufacturing method

A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

Fluid handling system and lithographic apparatus

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Lithographic apparatus and method

An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Object holder and lithographic apparatus

An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Lithographic apparatus and a method of manufacturing a lithographic apparatus

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Lithographic apparatus, drying device, metrology apparatus and device manufacturing method

An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

Immersion lithographic apparatus and device manufacturing method

Growing community of inventors

Veldhoven, Netherlands

Koen Steffens