Asml Netherlands B.v.

Koen Kivits

Haico Victor Kok

Ron Van De Laak

Gerbrand Van Der Zouw

Johannes Maria Kuiper

Hans Jansen

Hoite Pieter Theodoor Tolsma

Vasco Miguel Matias Serrao

Hoite P Theodoor Tolsma

Hans Kuiper

A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area.

Lithographic apparatus and methods

The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus

A method is provided for determining information relating to vibration. The method includes projecting an aerial image at an image position in a projection plane; mapping an intensity of the aerial image into an image map that contains values of coordinates of sampling locations and of the intensity sampled at each sampling location; and measuring intensity of the aerial image received through a slot pattern. The method may also include determining from the image map a detection position of a slope portion of the image map; at the detection position of the slope portion, measuring a temporal intensity of the aerial image and relative positions of the slot pattern and the image position; and determining from the temporal intensity of the aerial image information relating to vibration for the aerial image. The relative positions of the slot can be measured as position-related data of the slot pattern.

Method and apparatus for vibration detection, method and apparatus for vibration analysis, lithographic apparatus, device manufacturing method, and computer program

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Helmond, Netherlands

Koen Kivits