Asml Netherlands B.v.

Koen Goorman

Boris Menchtchikov

Jeroen Johannes Sophia Maria Mertens

Joost Jeroen Ottens

Frederik Eduard De Jong

Patricius Aloysius Jacobus Tinnemans

Marco Koert Stavenga

Theodorus Petrus Maria Cadee

Stoyan Nihtianov

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Erik Roelof Loopstra

Nicolaas Ten Kate

Johannes Henricus Wilhelmus Jacobs

Michel Riepen

Franciscus Johannes Joseph Janssen

Martinus Cornelis Maria Verhagen

Jacobus Johannus Leonardus Hendricus Verspay

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Herman Boom

Christianus Gerardus Maria De Mol

Richard Moerman

Marcel Johannus Elisabeth Hubertus Muitjens

Maria Elisabeth Reuhman-Huisken

Aschwin Lodewijk Hendricus Johannes Van Meer

Aschwin Lodewijk Hendricus Johannes Vermeer

Koen Jacobus Johannes Maria Zaal

Hermen Folken Pen

Antonius Johannes De Kort

Frederick Eduard De Jong

Edwin Van Gompel

Mana Elisabeth Reuhman-Huisken

Jacobus Johannus Leonardus Hendricus Verspaij

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Lithographic apparatus and device manufacturing method having liquid evaporation control

A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0&#xd7;10Kto reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

Calibration substrate and method for calibrating a lithographic apparatus

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.

Method of calibrating a lithographic apparatus and device manufacturing method

In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.

Lithographic method

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

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Eindhoven, Netherlands

Koen Goorman