Asml Netherlands B.v.

Koen Gerhardus Winkels

Johan Frederik Dijksman

Georgiy Olegovich Vaschenko

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Wilhelmus Henricus Theodorus Maria Aangenent

Theodorus Wilhelmus Driessen

Nicolaas Ten Kate

Chrysostomos Batistakis

Roger Josef Maria Jeurissen

Vadim Yevgenyevich Banine

Andrei Mikhailovich Yakunin

Antonius Franciscus Johannes De Groot

Ruud Antonius Catharina Maria Beerens

Siegfried Alexander Tromp

Lucas Henricus Johannes Stevens

Hendrikus Robertus Marie Van Greevenbroek

Antonius Theodorus Wilhelmus Kempen

Dirk Willem Harberts

Peter Michael Baumgart

Ramin Badie

Edwin Johannes Cornelis Bos

Wim Ronald Kampinga

Michael Marinus Anna Steur

Jan Okke Nieuwenkamp

George Alois Leonie Leenknegt

Dennis Dominic Van Der Voort

Jari Ruotsalainen

Substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure includes a distal surface that contacts, in use, a substrate being supported. Each burl structure has an opening to at least one of the holes formed through the base member.

Method of manufacturing a substrate support for a lithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use

A substrate support configured to support a substrate. The substrate support has a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support has a liquid supply channel configured to supply a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, to allow charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate

A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.

Method for predicting resist deformation

A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.

Supply system for an extreme ultraviolet light source

Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

Droplet generator for lithographic apparatus, EUV source and lithographic apparatus

A radiation source (e.g., LPP&#x2014;laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

Method and apparatus for generating radiation

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Eindhoven, Netherlands

Koen Gerhardus Winkels