Asml Netherlands B.v.

Asml Holding N.v.

Koen Cuypers

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Erik Henricus Egidius Catharina Eummelen

Rogier Hendrikus Magdalena Cortie

Nicolaas Ten Kate

Jeroen Gerard Gosen

Cornelius Maria Rops

Laurentius Johannes Adrianus Van Bokhoven

Han Henricus Aldegonda Lempens

Gheorghe Tanasa

Jorge Alberto Vieyra Salas

Johannes Cornelis Paulus Melman

Mark Johannes Hermanus Frencken

Harold Sebastiaan Buddenberg

John Maria Bombeeck

Evert Van Vliet

Marcel Maria Cornelius Franciscus Teunissen

Pepijn Van Den Eijnden

Floor Lodewijk Keukens

Frank Debougnoux

Jantien Laura Van Erve

Frank Johannes Jacobus Van Boxtel

Stef Marten Johan Janssens

Sudhir Srivastava

Hendrikus Johannes Schellens

Theodorus Johannes Antonius Renckens

Adrianus Marinus Wouter Heeren

Bo Lenssen

Erik Roelof Loopstra

Marco Koert Stavenga

Johannes Onvlee

Koen Steffens

Jan Steven Christiaan Westerlaken

Christopher Charles Ward

Günes Nakiboglu

Daniel Nathan Burbank

Mark Josef Schuster

Marinus Jan Remie

Henricus Jozef Castelijns

Robertus Nicodemus Jacobus Van Ballegoij

Martijn Van Baren

Albert Johannes Maria Jansen

Marcelo Henrique De Andrade Oliveira

Chattarbir Singh

Henricus Anita Jozef Wilhemus Van De Ven

José Nilton Fonseca Junior

A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

Lithography apparatus and device manufacturing method

A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate () positioned between the movable stage () and the projection system (). The plate includes an opening () that comprises a first sidewall () and a second sidewall (). The plate may be configured to provide a gas flow pattern () in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Gas flow optimization in reticle stage environment

A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including a gas outlet configured to direct a localized gas flow towards the sensor or target so as to displace liquid from the sensor or target over the cover and off the table.

An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

Lithographic apparatus and a device manufacturing method

Growing community of inventors

Lommel, Belgium

Koen Cuypers