Clondiag Chip Technologies Gmbh

Klaus Wohlfart

Torsten Schulz

Eugen Ermantraut

Johann Michael K&ouml;hler

Stefan W&ouml;lfl

The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less problems and more economically than the previous conventional layers, and which permit the use of existing technologies for microstructuring. The object is realized in that the thin layer is formed of an enzymatically degradable biopolymer in a range of layer thicknesses of from 30 nm to 3 &mgr;m. Biopolymeric thin layers manufactured according to the invention permit their application, after a respective structurizing, as test assays or in setting up substance libraries.

Kind of thin films for microsystem technology and microstructuring and their use

A bath for generating microstructures which is required in numerous fields of application of the microsystem technique and in microstructuring offers a less expensive alternative to known conventional approaches and disposal of the used bath may be carried out in a manner more environmentally friendly manner than in the previous methods for manufacture of microstructures. The bath includes at least one biogenic agent (in particular, an enzyme) which acts upon a preselectable thin layer.

Baths for producing microstructures

The invention relates to a method for producing structured, self-organized molecular monolayers of individual molecular species. The invention is preferably used to create solid-phase bonded substance libraries. To this end, a) a substrate ( ) suitable for the first monolayer is provided; b) a microstructured polymer mask ( ) having openings is applied to the subtrate ( ) at least once in a defined direction. Said polymer mask ( ) is sufficiently thin and flexible for it to adhere to the substrate ( ) by adhesion, and the material selected for the polymer mask ( ) is chemically stable; c) the sandwich constituted by the substrate ( ) and polymer mask ( ) is flooded with a first agent corresponding to the intended use, so as to create at least one first molecular monolayer in the areas defined by the mask openings; c1) depending on the monolayer structure to be created step c) is repeated using the first agent or one or more additional agents; and d) after carrying out the step described in c) or the steps described in c) and c1), the polymer mask is pulled off after modification of the substrate surface areas which were left uncovered by the mask openings and were subjected to the agent or agents.

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Laasan, Germany

Klaus Wohlfart