Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Wageningen University

Klaus Simon

Joeri Lof

Alexander Straaijer

Johannes Catharinus Hubertus Mulkens

Erik Roelof Loopstra

Bob Streefkerk

Joannes Theodoor De Smit

Antonius Theodorus Anna Maria Derksen

Roelof Aeilko Siebrand Ritsema

Christiaan Alexander Hoogendam

Aleksey Yurievich Kolesnychenko

Sjoerd Nicolaas Lambertus Donders

Jeroen Johannes Sophia Maria Mertens

Helmar Van Santen

Hendricus Johannes Maria Meijer

Timotheus Franciscus Sengers

Hans Butler

Frank Van Schaik

Erik Theodorus Maria Bijlaart

Theodorus Marinus Modderman

Arie Jeffrey Den Boef

Johannes Jacobus Matheus Baselmans

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Herman Vogel

Mark Kroon

Bernardus Antonius Slaghekke

Martijn Houkes

Gerardus Petrus Matthijs Van Nunen

Johan Frederik Dijksman

Karel Diederick Van Der Mast

Sander Frederik Wuister

Yvonne Wendela Kruijt-Stegeman

Krassimir Todorov Krastev

Raymond Jacobus Knaapen

Hans Jansen

Jacobus Johannus Leonardus Hendricus Verspay

Enno Van Den Brink

Gerardus Johannes Joseph Keijsers

Gerardus Petrus Mattijs Van Nunen

Hubertus Antonius Marinus Baijens

Levinus Pieter Bakker

Henricus Wilhelmus Maria Van Buel

Joseph Consolini

Johannes Teunis Zuilhof

Arnout Johannes Meester

Arthur Winfried Eduardus Minnaert

Erik Marie Jose Smeets

Raymond Jacobus Wilhelmus Knaapen

Wilhelmus Johannes Maria De Laat

Aleksey Yurievich Kolensnychenko

Maurice Anton Jaques Teuwen

Roelof Aeilko Siebranc Ritsema

Johannes Theodoor De Smit

Richard Joseph Travers

Frederick William Hafner

Vinyu Greenlee

Adrianus Hubertus Henricus Van Dijk

Ernst Jan Robert Sudholter

Qiao-Yu Sun

Michael Josephus Evert Van De Moosdijk

Roelof Aeiko Siebrand Ritsema

Sjoerd Nicolaas Lamburtus Donders

Antonius Derksen

Roelof Ritsema

Johannes Mulkens

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.

Imprint lithography

Growing community of inventors

Eindhoven, Netherlands

Klaus Simon