Von Ardenne Asset Gmbh &co. Kg

First Solar, Inc.

Von Ardenne Gmbh

Klaus Schneider

Thorsten Sander

Goetz Grosser

Steffen Mosshammer

Ralf Hauswald

Michael Rivkin

George Arthur Proulx

Bernd Teichert

Christoph Kaiser

Frank Meissner

Disclosed herein are devices, methods, and systems related to a magnetron-target coupling that includes a target coupling flange, a shaft fixedly coupled to the target coupling flange on a face opposite the target coupling flange, and having a first linear bearing component on a face opposite the target coupling flange. The magnetron-target coupling also includes a communication interface having a first communication electrode and a second communication electrode that are electrically coupled to each other wherein the second communication electrode is fixedly attached to the target coupling flange on a side opposite the shaft, the target coupling flange being disposed between the first communication electrode and the second communication electrode. The first communication electrode is supported such that it may be moved toward and/or away from the second communication electrode.

Magnetron target coupling and support device

Disclosed herein are systems, methods, devices for a magnet system that includes a housing with a housing interior. The magnet system also includes a magnet holder disposed in the housing interior and supported by the housing, preferably stationary with respect thereto. The magnet system also includes a housing cover forming a fluid-tight chamber when mated with the housing, wherein the housing cover includes a gear stage, a generator, and a rotary coupling that couples the gear stage to the generator.

Magnet system, sputtering device and housing cover

Disclosed herein are systems, methods, and devices related to a magnet system for a sputtering device. The magnet system includes a bearing frame and a magnet holder having a first mounting area and a second mounting area. The magnet system has a first support device mounted to the magnet holder by the first mounting area and a second support device mounted to the magnet holder by the second mounting area. At least one of the first mounting area and the second mounting area are configured such that a position in which the first support device and the second support device are mounted to the magnet holder relative to each other may be adjusted. The first support device and the second support device are configured to engage with the bearing frame to form a bearing device for supporting the magnet holder.

Magnet system and sputtering device

Disclosed herein are systems, devices, and methods for a magnet system for a sputtering device. The disclosed magnet system may include a housing having a housing interior. The magnet system may also include a magnet holder disposed in the housing interior and supported by the housing in a preferably stationary manner. The magnet system may also include a dehumidifying device adjacent to or disposed in the housing interior for drying the housing interior.

Magnet system, sputtering device and method

In various embodiments, a physical vapor deposition tile arrangement is provided. The physical vapor deposition tile arrangement may include a plurality of physical vapor deposition tiles arranged next to each other; and a resilient structure configured to press the plurality of physical vapor deposition tiles together.

Growing community of inventors

Arnsdorf, Germany

Klaus Schneider