Hoechst Aktiengesellschaft

Az Electronic Materials (luxembourg) S.a.r.l.

Klaus Rode

Dieter Mohr

Werner Frass

Joachim Gersdorf

Hartmut Wiezer

Rudolf Zertani

Sandra Stojanovic

Andreas Elsaesser

Klaus Joerg

Hubert Liebe

Hans-Werner Schock

Lars Blankenburg

Christian Kaufmann

Jan Schniebs

The invention relates to a thin-film solar cell () comprising a substrate () of metal or glass, a dielectric barrier layer () based on a polysilazane and a photovoltaic layer structure () of the copper-indium sulphide (CIS) type or the copper-indium selenide (CIGSe) type.

Solar cells with a barrier layer based on polysilazane

The invention relates polysilazane-containing coatings for increasing the light permeability of sun-facing covers of solar cells. The coating for surfaces contains at least one polysilazane of formula (1) &#x2014;(SiRR'R&#x2033;&#x2014;NR&#x2032;&#x2033;1)n- (1), wherein R&#x2032;, R&#x2033;, R&#x2032;&#x2033; are the same or different or represent an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl group, n being an integer and n being chosen in such a manner that the perhydropolysilazane has a number average molecular weight of 150 to 150,000 g/mol, a solvent and a catalyst. The cured coating has a thickness of at least 0.50-10 micrometer, preferably 0.2 to 5 micrometer, especially preferred 0.5 to 1.5 micrometer. It is especially suitable as transmission-promoting coating for use in sun-facing covers of solar cells.

Polysilazane-containing coatings for increasing the conversion efficiency of encapsulated solar cells

The invention relates to a method for producing passivation layers on crystalline silicon by a) coating the silicon with a solution containing at least one polysilazane of the general formula (1): &#x2014;(SiR'R&#x2033;&#x2014;NR&#x2032;&#x2033;)-n, wherein R&#x2032;, R&#x2033;, R&#x2032;&#x2033; are the same or different and stand independently of each other for hydrogen or a possibly substituted alkyl, aryl, vinyl, or (trialkoxysilyl)alkyl group, wherein n is an integer and n is chosen such that the polysilazane has a number average molecular weight of 150 to 150,000 g/mol, b) subsequently removing the solvent by evaporation, whereby polysilazane layers of 50-500 nm thickness remain on the silicon wafer, and c) heating the polysilazane layer at normal pressure to 200-1000&#xb0; C. in the presence of air or nitrogen, wherein upon tempering the ceramic layers release hydrogen for bulk passivation of the silicon.

Method for producing ceramic passivation layers on silicon for solar cell manufacture

A photopolymerizable mixture is described, which contains a polymeric binder; an acrylate or alkacrylate of a polyhydric alcohol possessing at least one photooxidizable group; a compound or a combination of compounds being capable of initiating the polymerization of the ester under the action of light in the spectral region of 450 nm to 650 nm; and at least one compound which absorbs light in the region below 450 nm or which upon exposure forms a compound absorbing light in said region, whereby the optical density of the exposed mixture in this region is at least 2.0 at a layer thickness of 2 .mu.m. The mixture is useful for the production of masters or intermediate masters for reprographic layers being sensitive to light in the UV region, exposure of the mixture itself being performed with visible light.

Photopolymerizable mixture and recording material prepared therefrom,

A photopolymerizable mixture is disclosed which comprises

Photopolymerizable mixture, and a recording material produced therefrom

A photopolymerizable mixture is disclosed that comprises,

Photopolymerizable mixture and recording material produced therefrom

A photopolymerizable mixture is described comprising (a) a polymeric binder, (b) an acrylate or alkacrylate of a polyhydric alcohol, said compound being free of urethane groups and further comprising at least one group which is photooxidizable on exposure to actinic radiation in the presence of a photoreducible dye, (c) a photoinitiator comprising a photoreducible dye, (d) a second photoinitiator comprising a trihalomethyl compound capable of being cleaved by irradiation, and (e) a third photoinitiator comprising an acridine, phenazine or quinoxaline compound. The mixture is suitable for the production of printing plates and photoresists and displays increased photosensitivity.

Photopolymerizable composition comprising (meth)acrylates with

A photopolymerizable mixture is described comprising (a) a polymeric binder, (b) an acrylate or alkacrylate of a polyhydric alcohol, said compound comprising at least one group which is photooxidizable on exposure to actinic radiation in the presence of a photoreduciable dye, (c) a photoinitiator comprising a photoreducible benzoxanthene or benzothioxanthene dye, and (d) a second photoinitiator comprising a trihalomethyl compound capable of being cleaved by irradiation. The mixture is suitable for the production of printing plates and photoresists and displays increased photosensitivity.

A photopolymerizable composition is described comprising (a) a polymeric binder, (b) an acrylate or alkacrylate of a polyhydric alcohol, said acrylate or alkacrylate being free of urethane groups and further comprising at least one group which is photooxidizable on exposure to actinic radiation in the presence of a photoreducible dye, (c) a photoinitiator comprising a photoreducible dye, and (d) a second photoinitiator comprising a trihalomethyl compound capable of being cleaved by irradiation. The composition is suitable for production of printing plates and photoresists and displays increased photosensitivity.

A photopolymerizable mixture is disclosed comprising:

A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.

Growing community of inventors

Wiesbaden, Germany

Klaus Rode