Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl Zelss Smt Ag

Klaus Rief

Karl-Eugen Aubele

Hubert Holderer

Ulrich Weber

Alexander Kohl

Johannes Lippert

Wolfgang Hummel

Jochen Weber

Thorsten Rassel

Erich Merz

Raoul Reiner

Markus Neumaier

Juergen Fischer

Michael Muehlbeyer

Stefan Schoengart

Baerbel Trossbach

Andreas Frommeyer

Stephan Back

Baerbel Schwaer

Alexander Vogler

Michael Mühlbeyer

Marco Jassmann

Sven Ulmer

Yuanbo Kong

Bärbel Trossbach

Stefan Schöngart

Jürgen Fischer

Alan L Brydon

Reiner Raoul

A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.

Damping device

A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.

Method for moving an optical element of a projection exposure apparatus for microlithography

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

Objectives, such as projection objectives for semiconductor lithography, are disclosed. An objective generally has an optical axis and optical elements mounted in an objective housing. Projection exposure apparatuses having an objective are also disclosed. In addition, guides and adjusting systems for an optical element in an objective are disclosed. Further, related components and methods are disclosed.

Projection objective for semiconductor lithography

Imaging device in a projection exposure machine

Holding devices for optical elements, as well as related modules, systems and methods are disclosed. The devices, modules, systems and methods may, for example, be used in the context of microlithography used in manufacturing microelectronic circuits.

Holding device for an optical element with support force equalization

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Growing community of inventors

Aalen-Oberalfingen, Germany

Klaus Rief