Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Leybold Aktiengesellschaft

Klaus Pochner

Willi Neff

Michael Scherer

Gerhard Lepperhoff

Ulrich Patz

Franz-Josef Trompeter

Jens Kamp

Georg L&uuml;tkemeyer

A device for the treatment of a flowing gas, such as an exhaust gas, includes at least one pair of smooth electrodes that are arranged opposite each other so that they form between them a discharge space through which a gas flows. For each pair of electrodes, at least one electrode is coated with a dielectric material on a side facing the discharge space. At least one electrode has one or more thickened areas facing the discharge space. The one or more thickened area has at least one opening through which the gas can flow. A device may be used in the cleaning of exhaust gases from internal combustion engines of motor vehicles as well as the cleaning of waste gases of power plants or waste incinerating plants.

Device and method for treating flowing gases, in particular exhaust gases

Process and device for operating an internal combustion engine with less pollutant emission

A barrier discharge device (4a, 4b, 4c) installed in a vacuum chamber (1) consists essentially of at least two facing electrodes (20, 22); a dielectric (22) situated between the electrodes (20, 22) and in the immediate proximity of one of these electrodes (20); and a power source (26), which is connected electrically to the electrodes (20, 22). The plasma particles and UV radiation generated during the electrical discharge between the electrodes (20, 22) pass through the electrode (22), which is permeable to UV radiation and plasma particles, and thus emerge from the discharge space. On the surfaces (5a, 5b), the UV radiation induces a photochemical cleaning process, and the impinging plasma particles induce a plasma-chemical cleaning process. The cleaning process is essentially independent of pressure and can be used at pressures of up to 10 bars, which means that the cleaning process can be operated in particular during the time in which the vacuum chamber (1) is being pumped out.

Process for cleaning a substrate using a barrier discharge

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Aachen, Germany

Klaus Pochner