Leybold Aktiengesellschaft

Leybold Systems Gmbh

Applied Materials Gmbh & Co Kg

Klaus Michael

Michael Scherer

Helmut Grimm

Andreas Petz

Tomas Baumecker

Rainer Gegenwart

Alfred Rick

Gert R&ouml;dling

J&uuml;rgen Henrich

J&uuml;rgen Ulrich

Peter Mahler

Jochen Ritter

Ulrich Patz

Manfred Arnold

Helmut Eberhardt

J&ouml;rg Krempel-Hesse

Reiner Gertmann

Josef Hoffmann

Guido Blang

Elisabeth Sommer

Oliver Burkhardt

Gerhard Moses

Lutz Kampmann

In an air lock for continuous introduction into and/or removal of workpieces from spaces ( ) separated atmospherically, the individual substrates ( ) are transported through a transfer channel ( ). At least one lock chamber ( ) serving to accommodate the substrates ( ) is arranged movably in the transfer channel ( ). During the substrate transport in the transfer channel ( ), the lock chamber ( ) is atmospherically separated both from the exterior ( ) having normal pressure and from the coating chamber ( ). The air lock ( ) includes a carrousel lock which has a carrousel housing ( ) and a lock chamber wheel ( ). On the periphery in the lock chamber wheel ( ) individual lock chambers ( ) are provided, in which the workpieces ( ) to be brought into the chamber to be loaded ( ) are inserted freely accessible on the normal pressure side. By turning the lock chamber wheel ( ), the substrates ( ) in the lock chambers ( ) are transported from the coating station &lsqb;sic; loading station&rsqb; (A) to the transfer station (B) into the treatment chamber ( ) diametrically opposite the normal pressure side. In the transfer station (B) the substrates ( ) are removed from the transfer channels ( ) by means of a transfer device ( &prime;) and are available for further treatment in the treatment chamber ( ).

Air lock for introducing substrates to and/or removing them from a treatment chamber

Vacuum treatment system for application of thin layers onto substrates (,) with a transfer chamber (,) and several treatment chambers (,), said treatment chambers peripherally attached to the transfer chamber and being connected to said transfer chamber by means of a common opening (,) for inlet and outlet of substrate (,), and with a handling device (,) for transport of the substrate (,) between the treatment chambers (,), whereby the handling device (,) has at least one substrate holder (,) with one pivot and/or rotating retaining part to hold the substrates (,), by means of which the substrates (,) can pivot and/or rotate in the treatment chambers (,).

Vacuum treatment system for application of thin, hard layers

In an air lock for continuous introduction into and/or removal of workpieces from spaces (,) separated atmospherically, the individual substrates (,) are transported through a transfer channel (,). At least one lock chamber (,) serving to accommodate the substrates (,) is arranged movably in the transfer channel (,). During the substrate transport in the transfer channel (,), the lock chamber (,) is atmospherically separated both from the exterior (,) having normal pressure and from the coating chamber (,). The air lock (,) includes a carrousel lock which has a carrousel housing (,) and a lock chamber wheel (,). On the periphery in the lock chamber wheel (,) individual lock chambers (,) are provided, in which the workpieces (,) to be brought into the chamber to be loaded (,) are inserted freely accessible on the normal pressure side. By turning the lock chamber wheel (,), the substrates (,) in the lock chambers (,) are transported from the coating station (A) to the transfer station (B) into the treatment chamber (,) diametrically opposite the normal pressure side. In the transfer station (B) the substrates (,) are removed from the transfer channels (,) by means of a transfer device (,&prime;) and are available for further treatment in the treatment chamber (,). The treatment chamber (,) includes, for instance, of a vacuum-coating chamber in which the workpieces (,) as the substrates to be coated are coated by a vacuum-supported coating method.

An apparatus is disclosed for the coating of substrates (,) with thin films, having a vacuum chamber (,), a target (,) to be atomized, situated opposite the substrate (,) in the vacuum chamber (,), with magnets (,) to produce a magnetic tunnel in front of the area of the target (,) to be atomized, an inlet (,) for a process gas into the process space (,), an anode (,), which is electrically insulated with respect to the vacuum chamber (,), and a current-voltage supply to produce a plasma in front of the target (,). The target (,) is shaped as a rotation-symmetrical body, which provides a ring-shaped enclosure around the substrate (,), wherein the magnets (,&prime;, . . . ) are supported on the side of the hollow cylindrical target (,), facing away from the substrate (,), and can move around the rotational axis (R) of the target (,). The substrate (,) is electrically insulated, with respect to the vacuum chamber (,), and a part of an insulator (,), configuring the anode (,), is supported on the bottom of the process space (,).

Apparatus for the coating of substrates in a vacuum chamber

For coating substrates (17,18,20,21,22) in a vacuum-coating chamber (2) the substrates are introduced by an air lock into the coating chamber (2) and moved along a transport path in front of the coating sources (50a,b,c,d) producing a coating cloud. To this end, the substrates (17,18,20,21,22) are led past the coating sources (50a,b,c,d) by means of holding devices (24) arranged movably on a transport belt (9) during at least two successive coating phases. During the one coating phase, the substrates (17,18,20,21,22) are oriented along one transport direction T.sub.3 oriented towards the coating sources (50a,b,c,d) such that essentially the substrate bottom of the cylindrical substrate is coated. During the subsequent second coating phase, the substrates are oriented in front of the coating sources (50a,b,c,d) in a direction T.sub.4 opposite the transport direction T.sub.3, wherein the substrates (17,18,20,21,22) are oriented such that essentially the cylindrical side surface is coated. By this method, the substrates (17,18,20,21,22) are coated successively in an identical manner and independently of possible substrate positions with relation to the coating sources (50a,b,c,d) during the coating process. Bottle-shaped containers, in particular, plastic bottles are vapor-coated with a gas- or fluid-barrier layer using the method. The coating sources (50a,b,c,d) include thermal vaporizers and/or plasma cathode sputter sources.

Method and device for transporting cylindrical substrates to be coated

The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.

Arrangement for coating substrates

The invention relates to a sputtering unit with an electrode (3) and a target (2) connected with this electrode (3) wherein this target (2) is interchangeable. Herein a consumed target (2) is replaced by a fresh and pre-sputtered target (7) thereby that the complete electrode (3) is replaced by a new electrode (6).

Sputtering unit

Method for machining flat, circular disk-shaped recording media, for example, audio, video or ROM compact disks, for the purpose of improving their surface quality and their dimensional stability, employs a lathe having a driven lathe spindle (7), a vacuum chuck (8) for holding the recording medium or substrate (15, 15'. . . ) to be machined, and a carriage (9) for holding and guiding the cuting tool (5) magazine (14) hold the machined and unmachined substrates, there being further provided a robot (10) held on the base (2) or bed (4) of the lathe and having a gripper arm (11) with gripping tongs (12) movable in several planes which transport the substrates from one magazine (14) to the vacuum chuck (8) or from the vacuum chuck to the other magazine, the stacking axes (L) of the two magazines extending at an angle to the horizontal plane (E), and the magazines being maintained within the range of action of the gripper arm (11) with gripping tongs (12).

Method for manufacturing disk-shaped recording media

In a device for transporting substrates in vacuum coating systems with several stations, comprising several substrate holders 16 of plate-like configurations which can e moved across the stations along a prescribed path of transportation in a vertical position and which interact with rails 13, 14 being provided in the area of their foot part 15 below the substrates 22, 23 to be mounted to the substrate holders 16, the foot part 15 of the substrate holder 16 has a pair of rails 13, 14 spaced parallel apart and disposed in a vertical plane. The smaller sides thereof, which face one another, have longitudinal grooves 13a, 14 which correspond with rollers 7, 8 or sliding pads being disposed stationary on the bottom part of the device and being provided in rows corresponding to the course of the grooves and in planes that are on top of each other and spaced vertically apart. The substrate holder 16 has a shaft-like recess 24 which extends from the top downward into the area of the foot part 15 parallel to the rails and into which, while passing the station, extends a flat heating device 11 extending vertically toward the bottom and disposed above the substrate holder 16 at the top wall part 4a. The substrate holder 16 surrounds the heating device 11 in a U-shaped manner.

Apparatus for transporting substrates in a vacuum coating system

A lathe apparatus for machining flat, circular disk-shaped recording media, for example, audio, video or ROM compact disks, for the purpose of improving their surface quality and their dimensional stability is provided which comprises a driven lathe spindle (7), a vacuum chuck (8) for holding the recording medium or substrate (15, 15') to be machined, a carriage (9) for holding and guiding the tool (5), and magazines (14) for holding the machined and unmachined substrates. A robot (10) provided on the base (2) or bed (4) of the lathe comprises a gripper arm (11) with gripping tongs (12) movable in several planes which transports the substrates from one magazine (14) to the vacuum chuck (8) or from the vacuum chuck to the other magazine. The stacking axes (L) of the two magazines extend at an angle to the horizontal plane (E), and the magazines are maintained within the range of action of the gripper arm (11) with gripping tongs (12).

Apparatus for machining workpieces, particularly flat circular

A device for the automatic cleaning, testing, and sorting of discoidal, flat substrates (9, 9', . . . ) for example magnetic memory plates, having three support mandrels (12, 13, 23) for the substrates (9, 9', . . . ) to be treated, three magazines (6, 7, 8) to deposit the treated and the untreated substrates (9, 9', . . . ), and having a transporting device fixed to a machine frame (2) or a machine support with several transferring arms (14, 15, 16) which can be moved on several levels and which are equipped with gripping devices (20, 21, 22) is provided with a motor-driven first support mandrel (23) rotating round its longitudinal axis (r) and with a nozzle (25, 26) disposed directly adjacent to said support mandrel in order to apply a cleaning liquid onto the substrate (9, 9', . . . ) which is firmly held by the first support mandrel. Moreover, each of the two further support mandrels (12, 13) disposed next to the first support mandrel (23) are provided with a scanning and testing device (27); the first transferring arm (14, 14', . . . ) serves to transport the substrate (9, 9', . . . ) from the first magazine (6) to the first support mandrel (23) and the second transferring arm (15, 15', . . . ) serves to transport the substrate (9, 9', . . . ) from the first to the second support mandrel (12) and the third transferring arm transports the substrate (9, 9', . . . ) from the second to the third support mandrel and from the latter to a second or third magazine (7 or 8). An electrical circuit which is disposed in the machine frame interacts with the testing device (27), thus actuating the motors of the transferring arms (14, 15, 16).

Growing community of inventors

Gelnhausen, Germany

Klaus Michael