Lambda Physik Ag

Klaus Mann

Uwe Stamm

Klaus Wolfgang Vogler

Dirk Basting

Uwe Leinhos

Gerd Eckert

Bernd Sch&auml;fer

Thomas Schr&ouml;der

A beam characterization monitoring apparatus receives an input VUV beam and measures a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam therein. Optics within the enclosure separate the input VUV beam into a first component for measuring a near field beam profile characteristic and a second component for measuring a far field beam profile characteristic. A detector coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species preferably detects the first and second components simultaneously. A quantum converter is preferably disposed along the beam path before the detector for converting the VUV beam to a beam having a wavelength above 240 nm. A second detector preferably detects an energy of an additional component of the input VUV beam.

VUV laser beam characterization system

A method and apparatus are provided for temporally stretching and smoothing of the pulses of an output beam of excimer and lithography lasers. The method and apparatus are based upon providing an optical delay line or circuit having a plurality of optical reflectors and a plurality of beam recombiners or splitters so arranged as to divide the pulse into numerous portions which vary in their travel time through the circuit. As a result, the energy of the incident pulse is greatly stretched and smoothed.

Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers

The present invention is an apparatus and method for stabilization of laser output beam characteristics by automatically adjusting the angular and the lateral positions of the output beam. A component of the output beam is detected at a far field location and also at a near field location along an optical path of the component. Both the angular and the lateral positions of the output beam are determined, as well as characteristics of the output beam, after the component is detected at both the near and the far field locations. Both the angular position and the lateral position of the output beam are automatically adjusted to optimize the output beam. The adjustment of both the angular position and the lateral position are made possible by using a beam steering device preferably including two mirrors.

Stabilization of angular and lateral laser beam position

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Goettingen, Germany

Klaus Mann