Leybold-heraeus Gmbh

Klaus-Jurgen Heimbach

Walter Zultzke

Albert Feuerstein

Wolf-Dieter Munz

Dieter Hofmann

Helmut Petersein

Helmut Warscheit

An underlayer of at least one a carbonitride of titanium, zirconium, hafnium or vanadium or hafnium nitride may be under a surface layer at least containing gold or on a still-undermore decorative article, and preferably both. It has a brilliance approximating that of gold so that, when appropriately color matched to the surface layer, it disguises spots of the surface layer worn away in use of the article. The underlayer and surface layer may be deposited in a cathode vaporization process from corresponding metallic cathode targets in appropriate neutral or reactive atmospheres.

Hard, gold-colored under layer for a gold or gold-containing surface

A vaporizer crucible for vacuum vapor-deposition apparatus, comprises a metallic body 1 having a recess 2 for accommodating vaporizing material and connected in a thermally-conductive manner to a cooling duct 7 which surrounds the recess 2 at least partially. For effectively preventing reduction in heat transfer in the event of the formation of vapor bubbles in the cooling medium at least one guide device 22 for imparting a swirling motion to the cooling medium flowing in the cooling duct 7 is provided in said duct. The guide device 22 preferably takes the form of a spiral element matching the path of the cooling duct.

Vaporizer crucible for vacuum vapor-deposition

An apparatus for regulating the evaporation rate of oxidizable substances in reactive vacuum deposition by the metered addition of oxygen to a vacuum deposition chamber during deposition, wherein the addition of oxygen to a predetermined value, the pressure 'p' in the vacuum chamber is measured, and the evaporation rate 'r' for any pressure changes is regulated such that the ratio of pressure to evaporation rate p:r is maintained substantially constant.

Apparatus for regulating the evaporation rate of oxidizable substances

A process for regulating the evaporation rate of oxidizable substances in reactive vacuum deposition by the metered addition of oxygen to a vacuum deposition chamber during deposition, wherein the addition of oxygen to a predetermined value, the pressure 'p' in the vacuum chamber is measured, and the evaporation rate 'r' for any pressure changes is regulated such that the ratio of pressure to evaporation rate p:r is maintained substantially constant.

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Hattersheim, Germany

Klaus-Jurgen Heimbach