Hoechst Aktiengesellschaft

Morton International, Inc.

Klaus Horn

Rainer Wingen

Roland Moraw

Gunther Schadlich

Reinhard Donges

Walter Lutz

Jurgen Sander

Jurgen Lingnau

Werner Frass

Juergen Lingnau

Kurt Walter Klupfel

Dieter Bosse

Georg Sader

Michael Roethe

Werner Hinter

Hans-Joachim Schulz

Gerald Schutze

Horst Weiler

Klaus-Peter Martens

A coating-removing solution for photo-cross-linked and thermally cross-linked photoresist masks and solder resist masks cross-linked by exposure to light and heat and which solution contains a diglycol monoalkyl ether, a glycol monoalkyl ether, an alkali hydroxide, water, and a water-soluble fluoride.

Water soluble fluoride-containing solution for removing cured

Described is a process for the patterned metallisation of structured printed circuit boards in which the fully structured printed circuit board is covered with a solder stop mask, with the solder contact locations being left open, the solder stop mask is heated under such conditions that complete hardening does not yet occur and the copper surface of the printed circuit board is practically not oxidized, metal is deposited out of an aqueous bath at the exposed solder contact locations and after the metal deposit operation the mask is heated sufficiently long to a sufficiently high temperature that the mask is completely hardened throughout. The incomplete pre-hardening step prevents the solution infiltrating under the mask in the metallisation operation and thereby loosening the adhesion thereof.

Process for the patterned metallisation of structured printed circuit

An apparatus for reprocessing special waste of photocrosslinkable scrap material is composed of a housing equipped with a feed hopper, one or more UV emitters arranged in the housing to irradiate the scrap material, and a chopper arranged in the housing to comminute the scrap material by chopping. The apparatus is usefully employed in a method for reprocessing photocrosslinkable scrap material.

Apparatus for reprocessing special waste

To produce a standard calibration and test element for the calibration and testing of reading and measuring instruments for bar codes and other test scales, a copper coating is applied to a ceramic substrate in a chemically depositing copper bath and degreased, and a photoresist coating is subsequently applied which is exposed through an exposure mask. This mask carries an image of the radiation-transparent and radiation-opaque regions of a pattern to be transferred onto the surface of the ceramic substrate. After removal of the mask, the photoresist coating is developed, the uncovered zones of the copper coating are etched in a metal chloride solution, and the remaining photoresist coating is removed by stripping. The uncovered, etched zones of the copper coating are dyed matt black in a metal bath. Finally, the conductive tracks are provided with a protective coating. The standard calibration and test element produced in this fashion comprises a ceramic substrate 1 as a carrier which contains a proportion of 96 to 97% of Al.sub.2 O.sub.3. The thickness of the element is 0.635 to 1.270 mm and the dimensions can extend from a 20 mm edge length to a size of 100.times. 100 mm.

Process for the production of a standard calibration and test element,

Disclosed are a photopolymerizable mixture and photopolymerizable copy materials made therefrom. The mixture contains a polymerizable compound having terminal acrylic or methacrylic acid ester groups, selected from a compound of one of the general formulas ##STR1## wherein R.sub.1 is a phenylene group or a biphenyldiyl group or a group formed by two phenylene groups which are linked by a bridge comprising an oxygen atom, a sulphur atom, a sulfone group, a substituted or unsubstituted alkylene group or cycloalkylene group, or a group of the formula --(O-alkylene).sub.n O-- with n=1-3,

Photopolymerizable mixture and photopolymerizable copying material

Described are 1,3-diaza-9-thia-anthracene-2,4-diones of the general formula (II) ##STR1## wherein R.sup.1, R.sup.3 and R.sup.4 are identical or different and individually each denotes a hydrogen or halogen atom, an alkyl, alkoxy, carboxyl or alkoxy-carbonyl group,

1,3-Diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixtures

The present invention relates to novel 10-phenyl-1,3,9-triazaanthracenes and to a photopolymerizable mixture which contains, as the essential components,

10-Phenyl-1,3,9-triazaanthracenes and photopolymerizable mixture

Disclosed are a photopolymerizable mixture and photopolymerizable copy materials made therefrom. The mixture contains a polymerizable compound having terminal acrylic or methacrylic acid ester groups and being selected from a compound of the formula I ##STR1## wherein R.sub.1 is a naphthylene group, a biphenyldiyl group or a dinaphthyl-methanediyl group or a group formed by two phenylene groups which are linked by a bridge comprised of an oxygen atom, a sulphur atom, a sulfone group or an alkylene group which is substituted by at least one carboxylic acid group, carboxylic acid alkyl ester groups, halogen atom or phenyl group, or by such a substituted alkylene group which is connected to the group R.sub.1 of another molecule via said substituent;

A process for producing relief copies wherein the light-hardenable layer of a light-hardenable copying material, which contains a photopolymerizable mixture, a photodimerizable polymeric compound or a diazonium salt polycondensation product, is exposed to a light image, the exposed layer is subjected to a brief ultrasonic treatment, and the unexposed areas of the layer are thereafter washed away by means of a developer. As a result of the ultrasonic treatment, shorter exposure times may be used and better in-depth hardening of the layer may be achieved.

Process for producing relief copies in light hardenable materials with

This invention relates to an improvement in a photopolymerizable mixture which contains, as the essential constituents, (a) a polymeric binder, (b) a photoinitiator, and (c) a polyester of an .alpha.,.alpha.'-bis-methylene-dicarboxylic acid and a dihydroxy compound.

Photopolymerizable unsaturated polyesters and copying material prepared

This invention relates to an improvement in a mixture which is polymerizable by radiation and contains, as the essential constituents, (a) a polymeric binder, (b) a polymerization initiator which can be activated by radiation, and (c) a compound of the formula I ##STR1## in which R.sub.1 is a divalent aliphatic group having 1 to 15 carbon atoms which also can be partially replaced by hetero-atoms, a divalent cycloaliphatic group having 3 to 15 carbon atoms, or a mixed aliphatic-aromatic group having 7 to 15 carbon atoms, and A is an electron-attracting radical. The invention also relates to a radiation-sensitive resist material using the improved radiation-polymerizable mixture.

Mixture which is polymerizable by radiation, and radiation-sensitive

A photopolymerizable mixture is described which contains a polymeric binder, a compound which is polymerizable by a free radical mechanism and has at least two ethylenically unsaturated polymerizable groups, a photoinitiator, and additionally contains a disulfide compound of the formula

Disclosed are a method and apparatus for holographically recording a plurality of holograms on a recording material. The method comprises producing two coherent light beams, altering one of these beams by an information bearing object, causing the changed beam to interfere with the other beam at an angle on the recording material, whereby the interference diagram is recorded, repeating these steps for further pieces of information with a changed recording characteristic obtained by altering the spacial arrangement of the two beams striking the recording material relative to a straight line stationary in the recording material by redirecting at least one beam with stationary optical elements.

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Hofheim, Germany

Klaus Horn