Carl Zeiss Microscopy Gmbh

Klaus Hegele

Dirk Preikszas

Josef Biberger

Ralph Pulwey

Michel Aliman

Christian Hendrich

Michael Schnell

Rainer Arnold

Momme Mommsen

Andreas Adolf

Harald Niebel

Edgar Fichter

Kai Schubert

Ernst Draszba

The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Particle beam apparatus and method for operating a particle beam apparatus

A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Method for producing a representation of an object by means of a particle beam, as well as a particle beam device for carrying out the method

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Aalen, Germany

Klaus Hegele