Nanda Technologies Gmbh

Mekra Lang Gmbh & Co. Kg

Klaus Eckerl

Rajeshwar Chhibber

Lars Markwort

Norbert Harendt

Werner Lang

Michael Witzke

Thomas Reinhard

An inspection system includes optics, an object support for mounting an object in a region of an object plane of the optics, a bright-field light source, and a dark-field light source. The inspection system also includes an image detector having a radiation sensitive substrate disposed in a region of an image plane of the optics and a beam dump.

Optical inspection system and method

An inspection system includes imaging optics for imaging an object plane into an image plane. The imaging optics include an objective lens having positive optical power, a first lens group having negative optical power, and a second lens group having positive optical power. The optical elements are arranged along a common unfolded optical axis with a pupil plane of the imaging optics located between the first lens group and the second lens group.

A wafer inspection system has a bright field imaging beam path and a dark field imaging beam path to obtain bright field images and dark field images of a full 300 mm wafer. The optical system provides for telecentric imaging and has low optical aberrations. The bright field and dark field beam paths are folded such that the system can be integrated to occupy a low volume with a small foot print.

A vehicle camera and wide-angle objective lens system are disclosed wherein the wide-angle objective lens has image aberrations or errors that do not deteriorate the detection of obstructions or obstacles in its field of view.

Growing community of inventors

Hutthurm, Germany

Klaus Eckerl