Koninklijke Philips Corporation N.V.

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Other

Ushio Denki Kabushiki Kaisha

Philips Corporate Intellectual Property Gmbh

Koninklijke Philips Electronics N.v.

Philips Intellectual Property & Standards Gmbh

Klaus Bergmann

Willi Neff

Jeroen Jonkers

Joseph Rr Pankert

Rainer Lebert

Ralf Pruemmer

Oliver Rosier

Guenther Hans Derra

Dominik Marcel Vaudrevange

Ralf Gordon Conrads

Joseph Robert Rene Pankert

Jürgen Klein

Guido Schriever

Arnold Jennemann

Berthold Bauer

Michael Löken

Stefan Seiwart

Felix Kuepper

Ralf PRÜMMER

Felix KÜPPER

Stefan Seiwert

The present invention relates to a method for improving the wettability of a rotating electrode with a liquid medium in a discharge lamp, in particular for the production of EUV radiation or soft X-rays, and a correspondingly designed gas discharge lamp. In the method, the edge surface of the rotating electrode to which the liquid medium is applied is microstructured by means of external processing. This microstructure significantly improves the wettability of the edge surface for the liquid medium. Furthermore, the distribution of the liquid medium over the edge surface can be controlled selectively by suitable choice of the microstructure.

Method for improving the wettability of a rotating electrode in a gas discharge lamp

The present invention relates to a method and device for generating optical radiation (), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma () is ignited in a gaseous medium between at least two electrodes (), wherein said gaseous medium is produced at least partly from a liquid material (), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (). At least two consecutive pulses () are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma ().

Method and device for generating optical radiation by means of electrically operated pulsed discharges

A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.

Extreme UV and soft X ray generator

The invention relates to a gas discharge lamp for EUV radiation with an anode () and a hollow cathode (), wherein the hollow cathode () has at least two openings (') and the anode () has a through hole (), which is characterized in that the longitudinal axes (&#x2032;) of the hollow cathode openings () have a common point of intersection S lying on the axis of symmetry () of the anode opening ().

Gas discharge lamp for extreme UV radiation

A gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation has at least two electrodes for providing a radiaton-emitting plasma in the intervening discharge space. One of the electrodes has a continuous opening to an adjoining outer region where charge carriers can be generated which can be transported through the opening in to the discharge space. The electrode opening narrows in the direction of the outer region.

Gas discharge lamp

A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography, wherein a discharge chamber () of a predetermined gas pressure and two electrodes () are used, wherein the electrodes have an opening (), respectively, positioned on the same symmetry axis () and, in the course of a voltage increase () upon reaching a predetermined ignition voltage (U), generate a plasma () located in the area between their openings (), which plasma is a source of the radiation (') to be generated,wherein an ignition of the plasma () is realized by affecting the gas pressure and/or by triggering,and wherein, with the ignition of the plasma (), an energy storage device supplies by means of the electrodes () stored energy into the plasma (), characterized in that the ignition of the plasma () is realized by using a predetermined ignition delay ().

Method and device for producing extreme ultraviolet radiation and soft x-ray radiation

In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.

Method and device for the generation of far ultraviolet or soft x-ray radiation

The invention relates to a device for generating extreme ultraviolet and soft x-rays from a gas discharge, operated on the left-hand branch of the Paschen curve. There are two main electrodes, between which there is a gas-filled space, and each main electrode exhibits an opening, by means of which an axis of symmetry &lsqb;( )&rsqb; is defined; and there are means to increase the conversion efficiency. Preferred fields of application are those requiring extreme ultraviolet (EUV) radiation or soft x-rays at a wavelength ranging from approximately 1 to 20 nm, and in particular around 13 nm, such as in EUV lithography.

Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge

The invention pertains to a machine tool for processing workpieces with tools, wherein the machine tool has a spindle housing that contains a spindle shaft and accommodates at least one tool as well as a drive device that causes a rotational movement of the spindle shaft. The machine tool is characterized by the fact that the drive device ( ) contains a hydraulically operated displacement machine or swash plate device.

Machine tool

A method and a device for generating extreme ultraviolet (EUV) and soft x-ray radiation from a gas discharge. The device has at least two electrodes each having a flush opening by which an axis of symmetry is defined, in which an intermediate space with a wide spatial homogenous gas filling between anode and cathode is provided. The electrodes are formed in such a way, that the gas discharge is formed exclusively in the volume defined by the flush openings. The current pulses with respect to amplitude and period duration are selected in such a way that a dense hot plasma channel is formed on the axis of symmetry, the plasma being the source of EUV and/or soft x-ray radiation. The preferred area of application is the EUV projection lithography in the spectral range around 13 nm.

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Herzogenrath, Germany

Klaus Bergmann