Asm IP Holding B.v.

Asm International N.v.

Klaas P Boonstra

Theodorus G M Oosterlaken

Chris G M De Ridder

Lucian C Jdira

Frank Huussen

Adriaan Garssen

Herbert Terhorst

Christianus Gerardus Maria De Ridder

Christianus G M De Ridder

Chaggai Shmuel Ganani

Jeroen De Jonge

Juul Keijser

De Chris G M Ridder

Arjen Klaver

Barend J T Ravenhorst

Gijsbert Hendrik Ronner

The disclosure relates to a substrate processing apparatus for processing a plurality of substrates. The apparatus comprising a reactor mounted in the apparatus and configured for processing substrates and a reactor mover for moving the reactor for maintenance. The reactor mover is constructed and arranged with a lift to move the reactor to a lower height to allow for access to the reactor by a maintenance worker.

Substrate processing apparatus, reactor mover for moving a reactor of the apparatus and method of maintaining the reactor of the apparatus

An injector configured to be placed in a process chamber of a batch furnace assembly for injecting a gas into said process chamber. The injector has an elongated, tubular housing enclosing an injection chamber. The housing has a gas inlet opening for supplying a gas from a gas source to the injection chamber, at least one gas supply opening for supplying the gas from the injection chamber into the process chamber, and a circumferential wall extending in a longitudinal direction of the housing. The circumferential wall comprises a first lateral wall half and a second lateral wall half. Both lateral wall halves substantially span a length of the housing in the longitudinal direction. The first and second lateral wall halves are fastened to each other by means of mechanical fastening.

Injector

An assembly of a liner and a flange for a vertical furnace for processing substrates is provided. The liner being configured to extend in the interior of a process tube of the vertical furnace, and the flange is configured to at least partially close a liner opening. The liner comprising a substantially cylindrical wall delimited by the liner opening at a lower end and closed at a higher end and being substantially closed for gases above the liner opening and defining an inner space. The flange comprising:

Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace

An assembly of a liner and a support flange for a vertical furnace for processing wafers, wherein the support flange is configured for supporting the liner, at least two support members that are connected to the cylindrical wall, each having a downwardly directed supporting surface, wherein each downwardly directed supporting surface is positioned radially outwardly from the inner cylindrical surface, wherein the support flange and/or the liner are configured such that, when the liner is placed on the support flange, the downwardly directed supporting surfaces are in contact with an upper surface of the support flange and support the liner, and wherein at least the part of the lower end surface of the liner that bounds the inner cylindrical surface is spaced apart from the upper surface of the support flange.

Assembly of liner and flange for vertical furnace as well as a vertical process furnace

A wafer boat for accommodating semiconductor wafers comprises two side rods and at least one back rod, the rods being vertically oriented and extending between a top member and a bottom member. The rods comprise vertically spaced recesses formed at corresponding heights, recesses at the same height defining a wafer accommodation for receiving and supporting a wafer in a substantially horizontal orientation, the recesses having an improved shape. The upwardly facing surfaces of the recesses comprise a first flat surface in an inward region of the recess which is horizontal or inclined upward in an outward direction of the recess and a second flat surface in an outer region of the recess which is inclined downward in an outward direction of the recess. The intersection of the first and second surface forming an edge for supporting the wafer. The recesses are easy to machine and prevent damage to the wafer.

Wafer boat

A semiconductor substrate processing apparatus (), comprising a substrate support assembly (), including a substrate support () defining an outer support surface () for supporting a substrate or substrate carrier () thereon, and a heater () comprising a heat dissipating portion () that is disposed within the substrate support () and that extends underneath and substantially parallel to the support surface (), said substrate support () being rotatably mounted around a rotation axis (L) that extends through said support surface (), such that the support surface () is rotatable relative to the heat dissipating portion () of the heater ().

Wafer processing apparatus with heated, rotating substrate support

A method for processing solar cells comprising:

Method for processing solar cell substrates

A wafer processing apparatus is provided with a wafer carrier comprising a doorplate, a pedestal including one or more legs to support the pedestal on the doorplate, and a wafer rack positionable on the pedestal. A pedestal lock is connected to the doorplate and is selectively engageable with at least one of the legs to lock the pedestal to the doorplate. A lock is further provided to selectively engage at least one of the wafer rack and the pedestal to lock the wafer rack to the pedestal. The pedestal is thereby prevented from falling off of the doorplate, and the wafer rack is prevented from falling off of the pedestal, during earthquake-induced vibrations and accelerations.

Growing community of inventors

Almere, Netherlands

Klaas P Boonstra