Nikon Corporation

Nec Corporation

Nippon Kogaku K.k.

Kiyoshi Uchikawa

Atsushi Miyamoto

Shigeru Matsumoto

Tomohisa Ishida

Sota Nakanishi

Hisao Ohsawa

Seishiro Saikan

Michael R Sogard

Akikazu Tanimoto

Bausan Yuan

Takayuki Suga

Saburo Kamiya

Masahiko Okumura

Yosuke Shirata

Tatsuo Niwa

Akira Furusawa

An element includes a plurality of light-receiving elements to photoelectrically convert light received from an object, a convolution processing unit to perform convolution operation on signals that are output from the plurality of light-receiving elements, and a pooling processing unit to sample a signal that is output from the convolution processing unit, based on a predetermined condition. The convolution operation of the convolution processing unit and the sampling of the pooling processing unit are repeated.

Element, system having the element, and judging apparatus

A feature extracting element including: a light-receiving substrate where a plurality of light-receiving elements for photoelectrically converting received light are two-dimensionally arrayed; and one or more other substrates that are laminated on the light-receiving substrate, wherein the other substrate has: a convolution processor which has a plurality of multiplying circuits that are correspondingly provided per the light-receiving element or per a block that is configured of a plurality of the light-receiving elements, and performs convolution operation on signals that are output from the plurality of light-receiving elements using the plurality of multiplying circuits; a pooling processing unit to sample a signal that is output from the convolution processor, based on a predetermined condition; and a connection wiring to pass the sampled signal to the plurality of multiplying circuits.

Feature extraction element, feature extraction system, and determination apparatus

Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system, wherein at least a part of one of the first object and the projection optical system is irradiated with a light beam having a wavelength range different from that of the exposure beam through a space waveguide mechanism, to correct an imaging characteristic of the projection optical system.

Exposure method and apparatus, and device production method

Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Interferometric position-measuring devices and methods

Methods are disclosed for manufacturing masks (reticles) as used in charged-particle-beam (CPB) microlithography. The methods can include inspecting the masks for defects, and repairing the defects. First, a &ldquo;parent&rdquo; mask is prepared from circuit-design data. The resulting pattern elements on the parent mask are inspected and compared with the circuit-design data to determine whether the data have been converted accurately into corresponding pattern elements on the parent mask. This inspection can be performed using an optical microscope. Detected mismatches and defects are corrected as required. The parent mask is used as a microlithography mask in the preparation, by &ldquo;reduction&rdquo; optical microlithography, a &ldquo;progeny&rdquo; mask. The pattern defined by the progeny mask is imaged and the image is digitized for comparison with a digitized image of the parent mask. The digitized images are compared using a computer. Any detected repairable defects are repaired, thereby completing fabrication of the CPB microlithography mask.

Charged-particle-beam microlithography masks and methods for manufacturing same

There is disclosed a down-traffic-signal transmission system for a mobile communication system in which communication between the base stations and the mobile station is performed in accordance with the CDMA scheme. A spread-coding apparatus provided in the base station comprises a valid signal determination unit for determining, as valid information, a control signal and/or a voice signal contained in a received traffic signal when correctly received, and determining, as invalid information, the control signal and/or the voice signal when incorrectly received; a selection instruction unit for outputting a timing signal based on results of the determination of the valid signal determination unit, the timing signal indicating that the control signal is valid or invalid information and that the voice signal is valid or invalid information; a selection unit which, in-accordance with the timing signal, assigns to the control signal and/or the voice signal determined as valid information a spread code that can be demodulated in the mobile station, and assigns to the control signal and/or the voice signal determined as invalid information a spread code that cannot be demodulated in the mobile station; and a modulator for modulating the control signal and the voice signal through use of the spread code assigned by the selection unit.

Down-traffic-signal transmission system

The recording method and apparatus according to this invention is an 'optical recording method utilizing a simulated photon echo' in which information is recorded by irradiating data a.d record excitation lights at the same time or at different times on the same location of a recording medium, and in which the delay time of a record excitation light electric field and a data light electric field is recorded as the information by use of a common incoherent light split into two equal parts: the data light and the record excitation light. In the reproducing method and apparatus according to this invention, reproducing excitation and probe lights are illuminated on the recording medium and the stimulated photon echo light emitted from the medium by illumination of the reproducing excitation light overlaps the probe light. The 'stimulated photon echo' reproducing the information is utilized by converting the synthetic light obtained from the overlap into an electrical signal at a photo detector. A common incoherent light is split into two equal parts, the reproducing excitation and the probe lights, whereby the delay time of the reproducing excitation light electric field and the probe light electric field is set to predetermined values, or a first predetermined value is swept to a second predetermined value.

Optical recording method and reproducing method and recording apparatus

The present invention relates to an optical measuring apparatus for measuring physicochemical properties of specimen, utilizing the optical echo which is a nonlinear optical phenomenon. Light emitted from a laser beam source in the optical measuring apparatus of the present invention is split into two beams, one of which is optically delayed by an optical delay unit and the other of which is phase-modulated at a predetermined frequency by a phase modulator. An optical mixer mixes the two beams outgoing from the optical delay unit and from the phase modulator, and the mixed beam is guided onto a specimen to form a light spot thereon. Light from the specimen is detected by a photodetector, and a modulation component even times larger than the modulation frequency of phase modulator is extracted from the output signal from the photodetector. The physicochemical properties of specimen can be measured by detecting an intensity of optical echo depending upon the optical delay time set by the optical delay unit.

Optical measuring apparatus for measuring physichemical properties

The recording method and apparatus according to this invention is an 'optical recording method utilizing a simulated photon echo' in which information is recorded by irradiating data and record excitation lights at the same time or at different times on the same location of a recording medium, and in which the delay time of a record excitation light electric field and a data light electric field is recorded as the information by use of a common incoherent light split into two equal parts: the data light and the record excitation light. In the reproducing method and apparatus according to this invention, reproducing excitation and probe lights are illuminated on the recording medium and the stimulated photon echo light emitted from the medium by illumination of the reproducing excitation light overlaps the probe light. The 'stimulated photon echo' reproducing the information is utilized by converting the synthetic light obtained from the overlap into an electrical signal at a photo detector. A common incoherent light is split into two equal parts, the reproducing excitation and the probe lights, whereby the delay time of the reproducing excitation light electric field and the probe light electric field is set to predetermined values, or a first predetermined value is swept to a second predetermined value.

Optical recording and/or reproducing apparatus and method utilizing

An electrochromic device including one electrode layer (A), a cathodically coloring electrochromic layer (B), an ionic conductive layer (C) if required, a reversibly oxidizable layer (D) and another electrode layer (E), at least one of the one electrode layer (A) and the other electrode layer (E) being transparent, and at least one of the cathodically coloring electrochromic layer (B), the ionic conductive layer (C) and the reversibly oxidizable layer (D) being adapted to contain protons or include a proton source for emitting protons upon application of a voltage. The reversibly oxidizable layer (D) comprises a transparent dispersion layer (D1) which is made by vacuum thin film formation techniques or thick-film processes and which comprises a metal iridium, iridium oxide or iridium hydroxide disperse phase (D11) and a transparent solid dispersion medium (D12), or the reversibly oxidizable layer (D) and the other electrode (E) are replaced with a single transparent conductive dispersion material layer (D1a) which is made by vacuum thin film formation techniques or thick-film processes and which comprises a metal iridium, iridium oxide or iridium hydroxide disperse phase (D11) and a transparent conductive solid dispersion medium (D 12a).

Growing community of inventors

Tokyo, Japan

Kiyoshi Uchikawa