Ricoh Company, Ltd.

Seikagaku Corporation

Ebara Corporation

Matsushita Electric Industrial Co., Ltd.

Sharp Kabushiki Kaisha Corporation

Other

Sony Corporation

Nec Corporation

Ricoh Corporation

Nissan Motor Company Limited

National Institute of Advanced Industrial Science and Technology

Kioritz Corporation

Sharp Kabuhsiki Kaisha

Kiyoshi Suzuki

Jonathan J Hull

Jumpei Fujikata

Mark Peairs

John F Cullen

Masaki Yamamoto

Koji Yamamoto

Noboru Murayama

Takeshi Ishimaru

Kazunori Mano

Yeong Shik Kim

Hiroshi Takahashi

Kurt W Piersol

Masaya Seki

Takashi Yoshikawa

Toru Matsuda

Takashi Harada

Hideyuki Watanabe

Tetsuya Hanamoto

Masayoshi Miyamoto

Teruyuki Maruyama

Tatsuo Miyachi

Yuichi Araumi

Hideki Takayanagi

Atsushi Hanai

Tatsuya Inagaki

Kiyoshi Morikawa

Hiroshi Maruyama

Toshikazu Minamisawa

Kaori Kanesaka

Masayuki Satake

Isao Sekita

Takako Isomura

Sadao Tatebayashi

Kazuyoshi Sugisaki

Wataru Takase

Tomokazu Sagara

Hiroyuki Kinbara

Kenichi Ito

Hiroyuki Sato

Yuji Kaneda

Kouichi Suzuki

Matsutaro Miyamoto

Michael Alan Baxter

Tomomi Katoh

Hiroshi Shimura

Yoichi Takahashi

Isao Masuda

Hiroshi Fujita

Toshio Isoe

Hiroshi Yonekura

Kentaro Miyamoto

Shuusei Murai

Noboru Nagai

Jun Hirabayashi

Osamu Sugihara

Hiroaki Nishiyori

Hideo Mochizuki

Tadashi Sumino

Takayasu Nagao

Masami Iida

Kazutoshi Obara

Tadashi Ozaki

Kiyoshi Mitani

Yoshitomo Itakura

Mitsuo Takanaga

Shuichi Miyaura

Yoshiteru Matsushita

Masanori Honda

Sadanori Kobashi

Hirofumi Endo

Satoru Kotani

Mami Iida

Tatsujiro Ogo

Yasutomo Nakahara

Minoru Takemoto

Takayo Sugiwaka

Yoshinori Kawaai

Osamu Suzuki

Hiromi Kaseyama

Takio Yoshida

Shigeki Oouchi

Yoko Kuzuoka

Nagamasa Asami

Wei Keat Yew

Norio Osawa

Kenichi Itho

Masaki Nishioka

Kiwamu Yamagishi

Naoko Kajimoto

Miwa Sawa

Masayuki Nishimoto

Akihiro Kumata

A liquid discharge device includes a liquid discharge head including nozzles configured to discharge a liquid, a carriage mounting the liquid discharge head and movable, a wiper configured to wipe a nozzle surface of the liquid discharge head, and a wiper mover configured to hold and move the wiper between a facing position at which the wiper faces the nozzle surface and a standby position at which the wiper does not face the nozzle surface. The carriage movably holds the liquid discharge head and the wiper mover as a single unit.

Liquid discharge device and liquid discharge apparatus

A leak check method includes: performing a first inspection of measuring a pressure in an internal space formed by a seal of the substrate holder, while evacuating the internal space, and detecting that the pressure reaches a first pressure threshold value within a predetermined first inspection time; performing a second inspection of closing the internal space that has been evacuated, measuring the pressure in the closed internal space, and detecting that the pressure in the closed internal space does not exceed a second pressure threshold value within a predetermined second inspection time; and performing a third inspection of measuring a pressure difference between the pressure in the closed internal space and a vacuum pressure in a master container, and detecting that an amount of increase in the pressure difference within a predetermined third inspection time is kept equal to or below a pressure difference threshold value.

Leak check method, leak check apparatus, plating method, and plating apparatus

There is provided a cleaning method and a cleaning apparatus capable of removing dirt on electrical contacts, the dirt being unable to be removed with deionized water, without adversely affecting a plating solution and a substrate holder which is a member for holding a substrate. A cleaning method according to the present disclosure is a cleaning method for a substrate holder having electrical contacts for supplying electric power to a substrate by contacting the substrate to plate the substrate, the method including a cleaning step of cleaning the electrical contacts attached to the substrate holder with a citric acid aqueous solution.

Cleaning method and cleaning apparatus

There is provided the substrate holder for holding a substrate comprising a first holding member, a second holding member, a sealing member, a pin, a ring, and a moving mechanism. The sealing member forms a sealed space inside the substrate holder. The pin is fixed to one of the first holding member and the second holding member. The ring is disposed on another of the first holding member and the second holding member. The ring engages with the pin. The moving mechanism circumferentially moves the ring. The pin and the ring are engaged with one another to fix the first holding member and the second holding member to one another. The pin and the ring are disposed inside the sealed space.

Substrate holder and plating apparatus

A method capable of removing a liquid from a seal of a substrate holder so as to prevent contact between the liquid and an electrical contact of the substrate holder is provided. The method includes: immersing the substrate in a plating solution, with a seal and an electrical contact of the substrate holder in contact with the substrate; applying a voltage between the substrate and an anode in the presence of the plating solution to plate the substrate; pulling up the plated substrate from the plating solution; separating the seal from the plated substrate; and forming a flow of gas passing through a gap between the plated substrate and the seal, the flow of gas being directed from an inside to an outside of the substrate holder.

Method of removing liquid from seal of a substrate holder

Electrical contact

Provided is a substrate holder where an effect of a pressure of a plating solution can be suppressed. A substrate holder includes first and second holding members for sandwiching a substrate. The first holding member includes: a support base; a movable base for supporting the substrate; and a biasing mechanism disposed between the support base and the movable base, and biasing the movable base in a direction along which the movable base is separated from the support base. The second holding member includes a protruding portion brought into contact with the substrate so as to seal the substrate. A biasing force of the biasing mechanism which is applied to a region or a position of the movable base differs from a biasing force of the biasing mechanism which is applied to another region or at another position of the movable base.

Substrate holder, plating apparatus, and method for manufacturing substrate holder

An object of the present invention is provide a method for sulfating a glycosaminoglycan in a solution of a non-organic solvent. In the present invention, sulfation reaction of a glycosaminoglycan is performed with a sulfating agent in a strongly basic solution of a non-organic solvent. In the present invention, pH of the strongly basic solution is preferably set to be 11.5 or higher. According to the present invention, for example, a glycosaminoglycan having heparin-like anticoagulant activity can be produced from N-acetylheparosan through one-pot procedure. In one embodiment, a sulfated glycosaminoglycan produced by the method of the present invention has a unique disaccharide composition and is expected to be a novel useful material.

Method for sulfating glycosaminoglycan

To provide a polypeptide having heparosan-glucuronate 5-epimerase activity, whereby means for producing a polysaccharide in which hexuronic acid residues has been epimerized is provided. Through screening ofcDNA library, a DNA encoding a polypeptide of heparosan-glucuronate 5-epimerase is obtained. The epimerase acts on glucuronic acid residues of N-acetyl heparosan and/or iduronic acid residues of completely desulfated N-acetylated heparin. The polypeptide encoded by the DNA is expressed by insect cells, to thereby yield the polypeptide having heparosan-glucuronate 5-epimerase activity. By bringing the polypeptide into contact with N-acetyl heparosan or completely desulfated N-acetylated heparin, a polysaccharide in which hexuronic acid residues has been epimerized is yielded.

Heparosan-glucuronic acid-5-epimerase, and method for producing polysaccharide using same

A novel modified polysaccharide, a solid phase to which the polysaccharide is adhered, methods for detecting N-deacetylase activity, N-sulfotransferase activity and N-deacetylase/N-sulfotransferase activity in a sample which utilizes said solid phase, and detection kits thereof.

Method for determination of N-deacetylase/N-sulfotransferase activity

A system and method for processing documents is described. The system and method provide for executing a command as part of the execution of an application program, where execution of the command causes the transfer of the document between a processing device in a computer system and a peripheral device. The present invention also provides for transferring the document data between the processing device and the peripheral device in response to the command. The present invention further provides for archiving the document data in a memory in the computer system in response to the command and transparently to the execution of the application program.

Automatic document archiving for a computer system

Chondroitin is produced by culturing a UDP-glucuronic acid-producing bacterium transfected with a kfoA gene derived fromK4 strain and a kfoC gene derived fromK4 strain and having chondroitin-producing ability. Chondroitin is collected from the bacterium.

Chondroitin-producing bacterium and method of producing chondroitin

Growing community of inventors

Tokyo, Japan

Kiyoshi Suzuki