Adeka Corporation

Adv Antest Corporation

Jsr Corporation

Heisei Polymer Co., Ltd.

Samsung Electronics Co., Ltd.

Tohoku University

Japan Royal Jelly Co., Ltd.

Kiyoshi Murata

Koichi Kimijima

Yoshihiko Watanabe

Tomoyuki Sugaya

Yasushi Ota

Takeo Oishi

Masamitsu Tsukada

Sami Akhtar

Hiroyuki Ishii

Tsutomu Shimokawa

Toru Kajita

Daisuke Sawamoto

Hyunwoo Kim

Tatsuya Yamada

Younsoo Kim

Masafumi Yamamoto

Atsushi Yamashita

Masatomi Irisawa

Younjoung Cho

Haruo Iwasawa

Hirokatsu Shinano

Haruyoshi Sato

Jun Numata

Norihiro Natsume

Akimasa Soyano

Seungmin Ryu

Tomoaki Saiki

Gyuhee Park

Kazuki Harano

Hiromichi Hara

Atsuo Tomita

Noboru Yamahara

Aki Suzuki

Shinichiro Iwanaga

Rieko Hamada

Yasunori Kozaki

Nobuhide Tominaga

Katsuji Douki

Taiki Mihara

Kenichiro Hiwatari

Kikuji Yamaguchi

Toru Yamakuni

An yttrium compound and a method of manufacturing an integrated circuit device, the compound being represented by General Formula (I):

Yttrium compound and method of manufacturing integrated circuit device by using the same

An oxime ester compound represented by general formula (I): wherein R, R, and Reach independently represent R, OR, COR, SR, CONRR, or CN; R, R, and Reach independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, Rand Reach independently represent R, OR, SR, COR, CONRR, NRCOR, OCOR, COOR, SCOR, OCSR, COSR, CSOR, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.

Oxime ester compound and photopolymerization initiator containing the same

A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which Ris an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R, R, R, R, R, R, and Ris nitro, and the compound (1) in which n is 0.  The symbols in general formula (1) are as defined in the description.

Compound and photosensitive resin composition

Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): 

Curable composition and cured article

An novel epoxy compound is represented by the general formula (I) and has a benzo- or naphtho-cycloalkane skeleton: X, Y, and Z each independently represent an alkyl group having 1-10 carbon atoms and optionally substituted with a halogen atom, an aryl group having 6-20 carbon atoms and optionally substituted with a halogen atom, an arylalkyl group having 7-20 carbon atoms and optionally substituted with a halogen atom, a heterocyclic group having 2-20 carbon atoms and optionally substituted with a halogen atom, or a halogen atom; k represents a number of 0-4; p represents a number of 0-8; r represents a number of 0-4; n represents 0-10; x represents a number of 0-4; y represents a number of 0-4; a sum of x and y is 2-4; and an optical isomer that exists when n is not 0 may be of any type.

Epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition

A polymerizable compound represented by general formula (1): wherein Zand Zeach represent a (meth)acryloyloxy group; Xand Xeach independently represent a single bond, an optionally branched alkylene group having 1 to 8 carbon atoms, an ether linkage, &#x2014;COO&#x2014;, &#x2014;OCO&#x2014;, &#x2014;OCOO&#x2014;, a 6-membered ring optionally having a substituent, or a combination thereof; Rrepresents &#x2014;R', &#x2014;OR&#x2032;, &#x2014;CO&#x2014;R&#x2032;, or &#x2014;OCO&#x2014;R&#x2032;; R&#x2032; represents a halogen atom, an optionally branched alkyl group having 1 to 8 carbon atoms, or a 6-membered ring optionally having a substituent, Land Leach independently represent a member selected from a single bond, &#x2014;CHCH&#x2014;, &#x2014;CH&#x2550;CH&#x2014;, &#x2014;C&#x2261;C&#x2014;, &#x2014;CHO&#x2014;, &#x2014;OCH&#x2014;, &#x2014;COO&#x2014;, and &#x2014;OCO&#x2014;; m represents an integer of 1 to 4; and the R's may be the same or different.

Polymerizable compound and polymerizable composition

A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using such compound. An oxime ester compound is represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: Rand Reach represent R, COR, CONRR, CN, etc.; R, R, and Reach represent a Calkyl group, etc.; Rand Reach represent R, OR, COR, CONRR, OCOR, CN, a halogen atom, etc.; a and b each represent an integer 0-4; X represents an oxygen atom, a sulfur atom, etc.; and Rrepresents OH, COOH, or a group represented by general formula (II).

To increase the overall efficiency of a test apparatus, provided is a test module that includes an instruction information storage section that stores instruction information indicating an order in which basic patterns are expanded; a basic pattern data storage section that stores basic pattern data; a plurality of pattern generating sections that each include a temporary instruction information storage section, which temporarily stores a portion of the instruction information, and that each generate a test pattern supplied to a device under test by expanding the basic pattern data in the order indicated by the instruction information stored in the corresponding temporary instruction information storage section; and a plurality of position information storage sections that independently store position information indicating reading positions of the instruction information stored in the instruction information storage section that is common to the plurality of pattern generating sections, in association with each pattern generating section.

Testing module, testing apparatus and testing method

A testing module including a designation information storing section that stores designation information designating an order of decoding fundamental patterns, a fundamental pattern storing section that stores the fundamental patterns, a plurality of pattern generating sections that each generate a test pattern to be supplied to a device under test, a plurality of position information storing sections that each store, in association with a corresponding pattern generating section, position information designating a read position from which the designation information is read from the designation information storing section, and an information transmission path shared by the pattern generating sections that transmits a part of the designation information from the designation information storing section to the designation information temporary storing section in each pattern generating section. Each pattern generating section decodes the fundamental patterns in an order designated by the partial designation information stored on the designation information temporary storing section.

Provided is test apparatus with higher testing efficiency, including: plurality of pattern generating sections generating test pattern to supply to devices under test; group control section controlling group of pattern generating sections out of the pattern generating sections, and generating control signal upon receiving signal output from any pattern generating section controlled; range information storage section storing range information indicating range of pattern generating sections, out of the pattern generating sections, that serve to test one independent device under test; and comprehensive control section receiving the control signal from the group control section, identifying any pattern generating section that supplies the test pattern to the same device under test as that to which the pattern generating section having output the signal supplies the test pattern based on the range information, and in response to the control signal, controlling any other group control section that controls the identified pattern generating section.

Testing apparatus and testing method

A test apparatus that tests a device under test is provided. The test apparatus includes: a pattern memory that stores in a compression format a test instruction sequence to define a test sequence for testing the device under test; an expanding section mat expands in a non-compression format the test instruction sequence read from the pattern memory; an instruction cache that caches the test instruction sequence which is expanded by the expanding section; a pattern generating section that sequentially reads instructions stored in the instruction cache and executes the same to generate a test pattern for the executed instruction; and a signal output section that generate a test signal based on the test pattern and provides the same to the device under test.

Test apparatus and electronic device

There is provided a testing apparatus that tests a device under test. The testing apparatus includes: a command executing unit operable to sequentially execute commands included in a test program for the device under test every command cycle; a test pattern memory operable to store pattern length identifying information identifying a pattern length of a test pattern sequence being output during a command cycle period executing the command and the test pattern sequence, in association with each command; a test pattern memory reading unit operable to read a test pattern sequence of a length corresponding to the pattern length identifying information stored on the test pattern memory in association with one command from the test pattern memory when the one command is executed; and a test pattern outputting unit operable to output the test pattern sequence read by the test pattern memory reading unit in association with the one command to a terminal of the device under test during a command cycle period executing the one command.

Test apparatus and testing method

A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.

Radiation-sensitive resin composition

The present invention provides a radiation sensitive resin composition which comprises (A) a resin represented by a copolymer comprising recurring units represented by the general formulae (1) or (2) as shown below, and (B) a radiation sensitive acid-generator. The radiation sensitive resin composition has an excellent storage stability and the resist produced from the composition is a chemically amplifiable type sensitive to radiations represented by fartificial ultraviolet rays. The resist has a high transparency to radiations and it is excellent in basic physical properties for resist such as durability to dry etching, sensitivity, resolution, and pattern configuration: 

Radiation sensitive resin composition

Growing community of inventors

Tokyo, Japan

Kiyoshi Murata