Nissin Electric Co., Ltd.

Emd Corporation

Daiichi Sankyo Company, Limited

Kiyoshi Kubota

Yasunori Ando

Akinori Ebe

Yuichi Setsuhara

Hiroshige Deguchi

Dongwei Li

Kenji Kato

Hitoshi Yoneda

Toru Miwata

Masaaki Dodo

Kenji Ikemoto

The impedance of an antenna is reduced and gaps generated between electrodes constituting a capacitance element and a dielectric body are eliminated. An antenna () for generating inductively coupled plasma P includes at least two conductor elements (), an insulation element () that is arranged between the mutually adjacent conductor elements () and insulates the conductor elements (), and a capacitance element () that is connected electrically to and in series with the mutually adjacent conductor elements (). The capacitance element () is configured from a first electrode (A) electrically connected to one of the mutually adjacent conductor elements (), a second electrode (B) electrically connected to the other of the mutually adjacent conductor elements (), and a liquid dielectric body filling the space between the first electrode (A) and the second electrode (B).

Antenna for generating plasma, and plasma treatment device and antenna structure provided with antenna for generating plasma

Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.

Plasma producing method and apparatus as well as plasma processing apparatus

Growing community of inventors

Kyoto, Japan

Kiyoshi Kubota