Canon Kabushiki Kaisha

Kiyohito Yamamoto

Takamitsu Komaki

Tadao Nakamura

Toshiki Ito

Keiji Emoto

Shigeru Terashima

Hisanobu Azuma

Masami Yonekawa

Kazuki Nakagawa

Naoki Kiyohara

Yuichiro Oguchi

Yoichi Matsuoka

Norikazu Baba

Toshihiro Maeda

Masayuki Nakajima

An imprint apparatus for performing an imprint process of forming a pattern of an imprint material on a substrate using a mold includes a mold holding unit that holds the mold, a stage that holds the substrate, a measurement unit that measures marks on the mold or the stage, a driving unit that brings the mold and the substrate into contact, a curing unit that cures the imprint material, and a control unit that controls various steps of the imprint process. The control unit obtains information about a difference between first and second position shift amounts obtained by measuring marks on the mold and substrate before and after performing a first imprint process, respectively. The control unit also controls the imprint apparatus to perform a second imprint process, following the first imprint process, based on the obtained information about the difference from performing the first imprint process.

Imprint apparatus and method of manufacturing article

An imprint apparatus for performing an imprint process of forming a pattern of an imprint material on a substrate using a mold is disclosed. The imprint apparatus includes an adjustment unit configured to adjust a shape of the mold and a control unit configured to control the imprint process. The control unit obtains information indicating a tendency concerning a change of the shape of the mold corresponding to a use count of the mold used for the imprint process and controls the adjustment unit to correct the shape of the mold in accordance with the obtained information and a present use count of the mold. The control unit also controls the imprint apparatus to perform the imprint process after the shape of the mold has been corrected by the adjustment unit.

An imprint mold includes a mesa portion projecting from a base material. The mesa portion includes a contact surface configured for contact with a curable composition made of an organic material, and a surface of a side wall at which the contact surface projects from the base material. A liquid repellent surface is formed on at least the surface of the side wall, the liquid repellent surface having a contact angle with respect to the curable composition being higher than a contact angle of the contact surface. The liquid repellent surface includes at least one type of compound selected from the group consisting of an oxide of an inorganic element, a fluoride of an inorganic element, and a nitride of an inorganic element.

Imprint mold, manufacturing method thereof, and imprint method

A replica manufacturing apparatus performs imprint processing of forming a pattern of an imprint material on a replica substrate using a master mold, processes the replica substrate with the formed pattern to manufacture a replica mold, and transfers data of a condition concerning the imprint processing to a management apparatus. An imprint apparatus acquires the data from the management apparatus, and performs the imprint processing of forming a pattern of an imprint material on a substrate using the replica mold.

Imprint system and article manufacturing meihod

An imprint apparatus includes a processing unit that forms a pattern of an imprint material on a substrate by using a mold, a chamber that accommodates this processing unit and includes a first gate to which a first containment unit that contains the substrate before being processed by the processing unit is connected and a second gate to which a second containment unit that contains the substrate after being processed by the processing unit is connected, and a control unit that prohibits opening of the first gate until a predetermined time elapses since the substrate on which the pattern is formed by the processing unit is contained in the second containment unit and the second gate is closed.

Imprint apparatus and method of manufacturing an article

An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.

Imprint apparatus, method of operating the same, and method of manufacturing article

There is provided a method of performing an analysis of a defect in a pattern of an imprint material on a substrate that has undergone an imprint process of transferring a pattern of a mold onto the substrate. The method includes obtaining a defect distribution of the pattern on the substrate, obtaining map information indicating an arrangement of the imprint material on the substrate, and determining a type of a defect based on a relationship between a position of the defect in the defect distribution and a position of a gap in the imprint material generated in a process of spreading the imprint material by the imprint process, wherein the position of the gap is predicted based on the map information.

Method of performing analysis of pattern defect, imprint apparatus, and article manufacturing method

A substrate holding apparatus including a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate, in which the second holding member attracts the second surface, and a forcing member for forcing the first holding member toward the second holding member.

Substrate holder and exposure apparatus having the same

An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit. The first and second alignment systems and the transfer system are arranged such that the second mark on the substrate transferred on the second stage is positioned within a view of the second image sensing unit.

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Utsunomiya, Japan

Kiyohito Yamamoto