Dainippon Ink and Chemicals, Incorporated

Dic Corporation

Other

Az Electronic Materials (japan) K.k.

Kiyofumi Takano

Yutaka Hashimoto

Kazunori Tanaka

Torao Higuchi

Masanori Kasai

Yusuke Takano

Hisatomo Yonehara

Hiroshi Kinoshita

Hatsuyuki Tanaka

Hideya Suzuki

Yasushi Akiyama

Masayoshi Kotake

Shin Sasamoto

Tsuneyuki Otaguro

Masayoshi Koutake

Jirou Matsuo

Hirofumi Yamaguchi

Hirofumi 2060-1-302 Wakamatsu-Cho Yamaguchi

The object of the present invention is to provide an organic transistor using an organic semiconductor having excellent transistor properties, and a method for producing the organic transistor, the present invention providing, first, an organic transistor including a gate electrode (b), an insulating layer (c), an organic semiconductor layer (d) which contacts the insulating layer (c) and has a channel formation area, and source/drain electrodes (e), which are formed on (a) a substrate, wherein the organic semiconductor layer (d) contains a fluorine-based compound (surfactant), and, secondly, a method for producing an organic transistor comprising a gate electrode (b), an insulating layer (c), an organic semiconductor layer (d) which contacts the insulating layer (c) and has a channel formation area, and source/drain electrodes (e), which are formed on (a) a substrate, the method comprising: a step in which the organic semiconductor layer (d) is formed on the insulating layer (c) by printing or coating an organic semiconductor solution containing a fluorine-based surfactant; or a step in which the insulating layer (d) is formed on the organic semiconductor layer (d) containing a fluorine-based surfactant by printing or coating.

Organic transistor and method for producing the same

Provided is an ink that is the most suitable for a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer substrate, for example, a microcontact printing method or a reverse printing method. Specifically, provided is an organic semiconductor ink composition which can provide a uniform ink coating film on a surface of a liquid-repellent transfer substrate and which can provide a dry ink film or a semi-dry ink film capable of being easily transferred from the transfer substrate to a transfer-receiving base material. Also provided is a method for forming an organic semiconductor pattern of an organic transistor, the method using the organic semiconductor ink composition. The organic semiconductor ink composition used for obtaining a desired pattern by transferring an ink layer formed on a liquid-repellent transfer substrate to a printing base material contains an organic semiconductor, an organic solvent, and a fluorine-based surfactant.

Organic semiconductor ink composition and method for forming organic semiconductor pattern using the same

A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R' represents a hydrogen atom or a methyl group, R&#x2033; represents a hydrogen atom or a non-fluorinated substituent, &#x2014;X&#x2014; represents any one of following four types of linking groups, &#x2014;X&#x2032; represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more. 

Fluorine-containing novolac resin, fluorine-containing surfactant, fluorine-containing surfactant composition, and resin composition

A fluorine-containing photocurable composition containing a (meth)acrylate having a fluorinated alkyl group (A) and a photopolymerization initiator (B). The (meth)acrylate (A) includes a group represented by general formula (1) and two or more (meth)acryloyl groups, and a fluorine atom content in one molecule of the acrylate is 25% by weight or more, and molecular weight of the (meth)acrylate is 500 to 4000 (in the general formula (1), R represents a hydrogen atom or alkyl group having 1 to 4 carbon atoms; X represents an alkylene chain, which may have a hetero atom, or a connecting group represented by the following general formula (2); and Rf represents a fluorinated alkyl group) (in the formula (2), Y represents an oxygen atom or a sulfur atom, m and n are an integer of 1 to 4 which may be the same as or different from each other; and Rfis a fluorinated alkyl group).

Fluorine-containing photocurable composition

The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E) and a production method for a pattern using the anti-reflective coating composition, (A) perfluoroalkyl&#x2022;alkylenesulfonic acid represented by the following formula (1): CF(CHCH)SOH (1) (wherein, n represents an integer from 1 to 20, and m represents an integer from 0 to 20); (B) organic amine; (C) water-soluble polymer; (D) perfluoroalkylethyl group containing compound represented by the following formula (2): CFCHCH&#x2014;X&#x2014;Y (2) (wherein, k represents an integer from 1 to 20, x represents a single bond or a divalent linking group, y represents an anionic group or a nonionic group, and this compound has a structure different from that of the component (A)); and (E) water.

Anti-reflective coating composition and production method for pattern using the same

The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110&times;10 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.

Surface active agent containing fluorine and coating compositions using the same

The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110&times;10,mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.

The anti-reflective coating composition comprising at least perfluoroalkylsulfonic acid (A) represented by the general formula: C,F,SO,H (n is an integer of 4 to 8), organic amine (B), water-soluble polymer (C), perfluoroalkyl sulfonamide (D) represented by the general formula: C,F,SO,NH,(n is an integer of 1 to 8) and water (E) and having a pH value of 1.3 to 3.3 is applied onto a photoresist film formed on a substrate, thus forming an anti-reflective coating. The photoresist and anti-reflective coating are then exposed to light and developed to give a resist pattern. The coating composition can form a uniform anti-reflective coating free of standing wave, multiple reflection, T-top and PED (Post Exposure Delay) in a small amount of drip onto any types of resists regardless of the surface shape of a substrate.

Composition for reflection reducing coating

The invention provides a surface active agent containing fluorine, which is a copolymer composed of several ethylenic unsaturated monomers containing a fluorinated alkyl group, a silicone chain, and a polyoxyalkylene group, and the surface loss energy of which is less than 110.times.10.sup.-5 mJ in an organic solvent. The copolymer of the surface active agent is soluble to water and in various organic solvents, and has a good compatibility with other ingredients used to form the coating compositions. The present surface active agent reduces the dynamic surface tension of the coating composition, and thereby, have a good foam-preventing property, coating compositions containing the present surface active agent yield coated films with uniform and smooth level surfaces without forming irregularity and striation even by coating operations at high speed and high shearing force.

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Chiba, Japan

Kiyofumi Takano