Nippon Kayaku Kabushiki Kaisha

Tokyo University of Science Foundation

Kiwamu Terada

Hirokazu Kuwabara

Koji Arimitsu

Kazuyoshi Yamamoto

This base proliferating agent is represented by formula (1) or (2), where, in formula (1) and (2), R1, R2, and R3 independently represent a hydrogen atom or a substituent and n independently represents an integer from 1 to 4. A base-reactive resin composition can include this base proliferating agent and a base-reactive compound.

Base proliferating agent, and base-reactive resin composition containing said base proliferating agent

This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R, R, R, Rand Rrepresent a hydroxy group or an alkoxy group; the R's independently represent an organic group containing a thioether bond; Rand Rindependently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; Rrepresents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion. 

Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator

This compound, which absorbs long-wavelength active energy rays and generates with high-efficiency radicals and strong bases, and which has excellent reaction efficiency in a base generating chain reaction, is represented by formula (1), where, in formula (1), R, R, R, Rand Rindependently represent a hydroxy group, an alkoxy group, or an organic group other than those substituents, the R's independently represent an organic group including a thioether bond, and 'A' represents a substituent represented by formula (1-1) or (1-2), where, in formula (1-1), Rand Rindependently represent a hydrogen atom, an alkyl group or a heterocyclic group, and where, in formula (1-2), Rand Rindependently represent an amino group or a substituted amino group. A photopolymerization initiator can include said compound; and a photosensitive resin composition can include said photopolymerization initiator. 

This base proliferating agent is represented by formula (1) or (2), where, in formula (1) and (2), R1, R2, and R3 independently represent a hydrogen atom or a substituent and n independently represents an integer from 1 to 4. A base-reactive resin composition can include this base proliferating agent and a base-reactive compound. 

The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): 

Compound, photopolymerization initiator comprising said compound, and photosensitive resin composition containing said photopolymerization initiator

Provided is a photosensitive resin composition that contains (A) a photobase generator and (B) an alkali-soluble epoxy compound, wherein the photobase generator (A) contains a compound represented by formula (2-1): and the alkali-soluble epoxy compound (B) is an epoxy compound obtained by reacting (c) a polybasic acid anhydride with a product of a reaction between (a) an epoxy compound having two or more epoxy groups in the molecule and (b) a compound having one or more hydroxyl groups and one carboxyl group in the molecule.

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Tokyo, Japan

Kiwamu Terada