Lasertec Gmbh

Other

Komatsu Corporation

Mitsui Grinding Wheel Co., Ltd.

Kiwamu Takehisa

Haruhiko Kusunose

Osamu Wakabayashi

Hiroki Miyai

Hakaru Mizoguchi

Shinji Nagai

Tsukasa Hori

Tatsuya Ariga

Jun Sakuma

Tatsuo Enami

Tsunehito Kohyama

Katsutomo Terashima

Naoki Awamura

Itaru Matsugu

Tatsumi Goto

Takayuki Ishida

Tatsumi Gotou

Yasuaki Iwata

Kouji Shio

Isao Ishizaki

Taro Uchiyama

Tetsuya Sendoda

Atsushi Tajima

A mask inspection apparatus according to the present disclosure includes: a field stop unit capable of switching between a field stop for an optical mask configured to emit an incident illumination light while maintaining the polarization state thereof and a field stop for an EUV mask configured to change the polarization state of a part of the incident illumination light and to cause an illumination light including an S-polarized light and a P-polarized light; a beam splitter unit capable of switching between a PBS for an optical mask and a non-polarized BS; an objective lens configured to collect an illumination light reflected in the beam splitter unit in a mask to be inspected and collect a reflected light obtained by reflecting an illumination light in the mask to be inspected; and a &#x3bb;/4 plate that can be provided in an optical path of an illumination light and a reflected light.

Mask inspection apparatus, switching method, and mask inspection method

A correction method according to an embodiment includes illuminating an object to be inspected by using critical illumination by illumination light Lgenerated by a light source, concentrating light from the object to be inspected illuminated by the illumination light Land acquiring image data of the object to be inspected by detecting the concentrated light by a first detector, concentrating part of the illumination light L, and acquiring image data of a brightness distribution of the illumination light Lby detecting the concentrated illumination light Lby a second detector, and correcting the image data of the object to be inspected based on the image data of the brightness distribution.

Correction method, correction apparatus, and inspection apparatus

An inspection apparatus according to an aspect of the present invention includes an EUV light source, an illumination optical systemprovided to apply the EUV light to an EUV mask, a concave mirror and a convex mirrorconfigured to reflect the EUV light reflected on the EUV mask, a cameraconfigured to detect EUV light reflected on the convex mirrorand thereby take an image of the EUV mask, an AF light sourceconfigured to generate AF light having a wavelength of 450 nm to 650 nm, first and second detectorsandconfigured to detect the AF light reflected on the EUV maskthrough the concave mirror with the holeand the convex mirror, and an processing deviceconfigured to adjust a focus point of the EUV light on the EUV mask

Inspection apparatus of EUV mask and its focus adjustment method

The disclosed invention relates to a COIL based defense system which stays at an altitude of higher than 17 km. The defense system is comprised of a high-altitude airship which carries a COIL in which gases flow along the optical axis with several exit ports. Since the COIL can operate without a vacuum pump, it can be lightweighted.

Iodine laser based defense system

Provided are a mask inspection apparatus and a mask inspection method that can prevent a reduction in a reflectance of a drop-in mirror, which is caused by carbon contaminants. A mask inspection apparatus according to the present invention includes a drop-in mirror including multi-layer film and a reflective surface. The drop-in mirror is configured to reflect illumination light incident on the reflective surface and illuminate the mask. An area of the reflective surface is configured to be greater than an area of an illuminated spot irradiated with the illumination light on the reflective surface. The drop-in mirror is configured to be movable. A position of the illuminated spot on the reflective surface is configured to be moved when the drop-in mirror is moved.

Mask inspection apparatus and mask inspection method

A laser light source device having a simple configuration and an inspection device are provided. A laser light source deviceaccording to an exemplary embodiment in accordance with the present invention has a repetition frequency of 1 MHz or higher, and includes fundamental wave generation meansfor oscillating laser light including a fundamental wave with its center wavelength being included in one of first to fourth wavelength bands, and meansfor generating a sixth harmonic of pulsed laser light extracted from the fundamental wave generation means. The first wavelength band is 1064.326 nm to 1064.511 nm. The second wavelength band is 1064.757 nm to 1064.852 nm. The third wavelength band is 1063.805 nm to 1063.878 nm. Further, the fourth wavelength band is 1063.962 nm to 1064.031 nm.

Laser light source device and inspection device

The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.

Interferometer and phase shift amount measuring apparatus with diffraction gratings to produce two diffraction beams

Provided with a pellicle inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography. The pellicle inspection apparatus includes: an illumination optical system that projects a converging illuminating beam toward the pellicle film; a light collection optical system including an object lens having an optical axis substantially orthogonal to the pellicle film and that collects scattering light outgoing from a foreign substance present on the pellicle film; and a detection system that detects the scattering light collected by the light collection optical system, wherein an incident angle &#x3b8;2 of the illuminating beam with respect to the pellicle film satisfies Expression &#x3b8;2&#x2212;&#x3b8;0&#x3e;&#x3b8;1+23&#xb0;, where &#x3b8;0 is a collecting angle (half angle) of the illuminating beam, and &#x3b8;1 is a maximum light-receiving angle (half angle) of the object lens.

Pellicle inspection apparatus

The disclosed invention relates to a pulsed iodine laser apparatus. The laser apparatus has a flashlamp-pumped iodine laser oscillator which produces a laser pulse with a full pulse width of longer than 1 microsecond, and a COIL amplifier. The laser apparatus may has a controller which controls the timing of injecting chlorine gas contained in a high-pressure chlorine tank into the singlet oxygen generator by outputting an open/close signal of the valve V, and the timing of injecting iodine molecules contained in a iodine molecule tank into an amplifier chamber of the COIL amplifier.

Pulsed iodine laser apparatus

The disclosed invention relates to a method of realizing a laser processing system. The system relating to one aspect of the invention is provided with a processing laser, a vaporization laser, and an oscillator controller. The processing laser is a flashlamp-pumped 1.06 &#x3bc;m solid-state laser, a pulsed iodine laser or an oxygen molecule laser. The vaporization laser is a pulsed laser whose wavelength is longer than 1.4 &#x3bc;m.

Laser processing method and laser processing system

The disclosed invention provides an oxygen laser oscillator which can obtain a direct lasing from a singlet oxygen molecule (O(&#x394;)). The oxygen laser oscillator () according to the embodiment includes: a singlet oxygen generator () having a rotating disc (); and a laser cavity () positioned immediately above the singlet oxygen generator () and directly connected to the singlet oxygen generator (). In the oxygen laser oscillator according to the embodiment, a separation wall () may be placed between the singlet oxygen generator () and the laser cavity ().

Oxygen laser oscillator

The disclosed invention relates to a method of realizing an oxygen laser oscillator. The laser oscillator relating to one aspect of the invention is provided with a laser cavity consisting of a high-reflectivity mirror () and a partial-reflectivity output mirror (), a singlet oxygen generator (), a focusing optics (), and a shutter (). Singlet oxygen (O(&#x394;)) is supplied to the chamber (A) which is pumped beforehand by a vacuum pump. In order to produce a laser oscillation, the shutter () is pulled out so that the radiation from O(&#x394;) goes back and forth inside the laser cavity. This causes a stimulated emission from O(&#x394;), and a pulsed laser is extracted from the output mirror ().

According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.

Photomask inspection apparatus

According to one aspect of the present invention, there is provided an illumination apparatusincluding a laser source, a two dimensional diffraction opticson which laser beam from the laser source is made incident, a rectangular rodon which diffraction beams from the two dimensional diffraction opticsare made incident and through which incident beams travel while repeating total reflection, and a galvano mirrorchanging an incident position of the diffraction beams from the two dimensional diffraction opticsin an incident end surface of the rectangular rod

Illumination apparatus and illumination method

An oscillation method and a device of fluorine molecular laser with narrow spectral line width are provided. For this purpose, the device includes main electrodes () for performing main discharge () in substantially a same direction as an optical axis of laser light () to be oscillated to excite a laser gas containing fluorine, an insulator () which is held between the main electrodes and into which the laser gas containing fluorine is injected, and resonators () which are placed with the insulator between them, and a space (M(&#x3bb;)) of a vertical mode expressed in wavelength is made larger than full width at half maximum (&#x394;&#x3bb;) of a gain curve (R) of the laser gas.

Growing community of inventors

Yokohama, Japan

Kiwamu Takehisa