Samsung Display Co., Ltd.

Kiseong Seo

Mugyeom Kim

Changyong Jeong

Jekil Ryu

Jungho Choi

Wonkyu Choe

Junhee Lee

Deok Hoi Kim

Taeyoung Ahn

Sangwook Lee

Seunghyun Lee

Jae Sul An

Jungyun Jo

Tetsuhiro Tanaka

Chang Ok Kim

Changok Kim

Jihoon Oh

Jieun Nam

Jonghyun Yun

Junmo Im

Hyeongsuk Yoo

Yeong-Gyu Kim

A display apparatus includes a base substrate including a display area and a peripheral area, a conductive layer formed on the base substrate in an entirety of the peripheral area and the display area, a buffer layer on the conductive layer, a thin film transistor on the buffer layer in the display area, an electrode in a contact hole that is formed through the buffer layer to expose a side surface of the conductive layer in the peripheral area, the electrode making contact the conductive layer, an insulating pattern in the contact hole on the electrode, and a wiring on the insulating pattern and electrically connected to the electrode.

Display apparatus and method of manufacturing the same

A display apparatus includes a display region and a peripheral region adjacent to the display region. The display apparatus further includes a first flexible substrate (FFS), a driving circuit (DC), a conductive pattern (CP), a conductive line, a light-emitting device, and a support substrate. The FFS includes a first surface and a second surface opposite the first surface. The second surface includes, in the peripheral region, a cavity extending into the FFS. The DC is on the first surface and includes at least one transistor. The CP is in the cavity and is partially exposed by the cavity. The conductive line electrically connects the CP to the DC. The light-emitting device is in the display region and is electrically connected to the DC. The support substrate is on the second surface. In a view normal to the second surface, the support substrate is spaced apart from the CP.

Display apparatus including conductive pattern in substrate and method of manufacturing the same

A display device may include a first active layer disposed on a substrate, a scan line disposed on the first active layer, a lower gate signal line disposed on the scan line, an oxide semiconductor pattern disposed on the lower gate signal line, and including a channel part that overlaps the lower gate signal line and a low-resistance part formed on a side portion of the channel part, a metal pattern disposed on at least one surface of the low-resistance part, and an upper gate signal line disposed on the oxide semiconductor pattern to overlap the channel part.

Display device

A method of manufacturing a display device comprises the steps of: forming a protective film on a first surface of a first base substrate; forming a polarizer including a plurality of wire grid patterns provided on a second surface of the first base substrate facing the first surface; removing the protective film from the first surface; and forming a pixel array layer on the first surface.

Method of manufacturing display device

A display apparatus includes a first substrate including pixels, a second substrate facing the first substrate, and a liquid crystal layer interposed between the first substrate and the second substrate. Each of the pixels includes a thin film transistor disposed on a first insulating substrate, a first protective layer that covers the thin film transistor and includes a SiOC layer, a first electrode disposed on the first protective layer, a second protective layer that covers the first electrode, and a second electrode disposed on the second protective layer.

Liquid crystal display and method of manufacturing the same

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Yongin-si, South Korea

Kiseong Seo