Applied Materials Israel Limited

Kirill Savchenko

Boaz Cohen

Assaf Asbag

Ohad Shaubi

Ore Shtalrid

Zeev Zohar

Shiran Gan-Or

There is provided a method of automated defects' classification, and a system thereof. The method comprises obtaining data informative of a set of defects' physical attributes usable to distinguish between defects of different classes among the plurality of classes; training a first machine learning model to generate, for the given defect, a multi-label output vector informative of values of the physical attributes, thereby generating for the given defect a multi-label descriptor; and using the trained first machine learning model to generate multi-label descriptors of the defects in the specimen. The method can further comprise obtaining data informative of multi-label data sets, each data set being uniquely indicative of a respective class of the plurality of classes and comprising a unique set of values of the physical attributes; and classifying defects in the specimen by matching respectively generated multi-label descriptors of the defects to the multi-label data sets.

Machine learning-based classification of defects in a semiconductor specimen

A system, method and computer readable medium for classifying defects, the method comprising: receiving classified first defects, and potential defects, each first and potential defect having values for attributes; processing the first and potential defects to select a subset of the attributes that differentiates the first defects from the potential defects; obtaining first and second functions based on the first defects and potential defects, respectively; obtaining a first threshold for the first function, and a second threshold for a combination of the first and second functions; applying the first function and the second function to each potential defect to obtain first and second scores, respectively; and determining a combined score of the first and second scores; and indicating as a defect of a potentially new type a potential defect when the first score is lower than the first threshold or the combined score exceeds the second threshold.

Method of classifying defects in a semiconductor specimen and system thereof

There are provided a classifier and a method of classifying defects in a semiconductor specimen. The classifier enables assigning each class to a classification group among three or more classification groups with different priorities. Classifier further enables setting purity, accuracy and/or extraction requirements separately for each class, and optimizing the classification results in accordance with per-class requirements. During training, the classifier is configured to generate a classification rule enabling the highest possible contribution of automated classification while meeting per-class quality requirements defined for each class.

An examination system, a method of obtaining a training set for a classifier, and a non-transitory computer readable medium, the method comprising: upon receiving in a memory device object inspection results comprising data indicative of potential defects, each potential defect of the potential defects associated with a multiplicity of attribute values defining a location of the potential defect in an attribute space: sampling by the processor a first set of defects from the potential defects, wherein the defects within the first set are dispersed independently of a density of the potential defects in the attribute space; and obtaining by the processor a training defect sample set comprising the first set of defects and data or parameters representative of the density of the potential defects in the attribute space.

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Lod, Israel

Kirill Savchenko