Matsushita Electric Industrial Co., Ltd.

Kinzou Nonomura

Yoshiki Sasaki

Masaki Aoki

Ryuichi Murai

Akira Shiokawa

Hiroyoshi Tanaka

Masatoshi Kudoh

Shigeo Suzuki

Mitsuhiro Ohtani

Hideaki Yasui

Koichi Kotera

Junichi Hibino

Hiroyuki Yonehara

Masafumi Ookawa

Nobuyuki Kirihara

Katuyoshi Yamashita

Kazuo Ootani

Hidetaka Higashino

A method of producing a gas discharge panel includes forming a surrounding unit by positioning a first panel and a second panel together with barrier ribs to partition the space between the panels into cells for light emission when charged with a plasma gas and appropriately addressed. An anti-sealing material inflow rib surrounds the barrier ribs. Sealing material is positioned outside the anti-sealing material inflow rib. The pressure inside the surrounding unit is adjusted to be lower than pressure outside the surrounding unit while applying heat to fuse the sealing material between the first panel and the second panel whereby sealing material is prevented from inflowing into the cells between the barrier ribs during production.

Sealing method and apparatus for manufacturing high-performance gas discharge panel

A method is provided to steadily produce a gas discharge panel, such as a PDP, in which a panel and the top of the barrier ribs are in intimate contact in entirety. First a surrounding unit for the gas discharge panel is formed, then a process for sealing the surrounding unit with a sealing material inserted between two panels at the rim is performed while pressure is adjusted so that pressure inside the surrounding unit is lower than pressure outside. With this construction, the panels constituting the surrounding unit are bonded together while they are pressurized from outside. As a result, a panel and the top of the barrier ribs on the other panel are bonded together while they are in intimate contact in entirety. To fully acquire these effects, it is preferable that the adjustment of pressure starts before the sealing material hardens. During, before, or after the sealing step, an energy such as laser beams or ultrasonic waves may be radiated onto the top of the barrier ribs to bond a panel and the top of the barrier ribs in entirety almost without a gap between them.

A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO , MgO, TiO , Al O , and Cr O . The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

Plasma display panel suitable for high-quality display and production method

A gas discharge panel in which cell filled with a discharge gas are arranged as a matrix between a pair of opposed plates, and in which a pair of display electrodes on a surface of one of the pair of opposed plates extend across a plurality of cells in the direction of rows, where a gap between the pair of display electrodes has two discharge gap widths one of which is larger than the other. The voltage is lowered and the power consumption is properly restricted by starting the discharge at the discharge gap at a space having the smaller gap width. An excellent discharge efficiency is secured by sustaining the discharge at a space having the larger gap width.

Gas discharge panel

A PDP does not suffer from dielectric breakdown though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO , MgO, TiO , Al O , and Cr O . The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 .mu.m layer of a metallic oxide on whose surface OH groups exist, such as ZnO, ZrO.sub.2, MgO, TiO.sub.2, Al.sub.2 O.sub.3, and Cr.sub.2 O.sub.3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is than coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

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Ikoma, Japan

Kinzou Nonomura