Seiko Instruments Inc

Toyo Soda Manufacturing Co., Ltd.

Other

Kabushiki Kaisha Daini Seikosha

Research Development Corporation of Japan

Seiko Instruments & Electronics Ltd.

Kingo Itaya

Kimio Shibayama

Tatsuaki Ataka

Koji Iwasa

Shinobu Toshima

Toshihiko Sakuhara

Teruo Fujimoto

Kazutoshi Kaji

Eisuke Tomita

Shueh Lin Yau

A process for synthesizing iron(III) hexacyanoferrate(II) as a blue insoluble product on the surface of a working electrode is disclosed which comprises immersing a pair of electrodes in a solution mixture of an iron(III) ion-containing solution and a hexacyanoferrate(III) ion-containing solution and effecting electrolysis with one of the electrodes as an anode and the other as a cathode, whereby iron(III) hexacyanoferrate(II) is deposited on the surface of the cathode.

Film of iron (III) hexacyanoferrate (II) and process of synthesizing same

A silicon substrate is etched by dipping it in a NH.sub.4 F solution while charging it with a potential more negative than an open-circuit potential. The NH.sub.4 F solution preferably has NH.sub.4 F concentration of 10M or less. The potential applied to the silicon substrate is controlled within the range of from the open-circuit potential to a more negative potential by -1.5 V vs. SCE. Since the etched silicon substrate has flatness in atomic order, it is suitable for the precise fabrications to manufacture high-density ir high-functional semiconductor devices.

Etching method using NH.sub.4 F solution to make surface of silicon

Apparatus and method for tunnel current measurement observed simultaneously with electrochemical measurement using an electrochemical cell. The electrochemical cell holds a tip, a counter electrode, a reference electrode and a sample in a solution. In the electrochemical cell, a tunnel current flowing between a sample and the tip is detected while controlling the electrode potential of the sample in a solution for electrochemical measurement. The detected tunnel current is represented as the surface image of the sample during electrochemical reaction.

Apparatus and method for tunnel current measurement observed

An electrochromic display device comprises an electrolyte contained between a pair of spaced-apart substrates. A set of electrodes are disposed on at least one of the substrates in contact with the electrolyte and a layer of electrochromic material is disposed on at least one of the electrodes to define a display electrode. The electrochromic material comprises a color-reversible salt of iron(III) hexacyanoferrate(II) which, depending on its oxidation-reduction state, exhibits different colors. A source of electric charge is connected through circuitry to effect reversible electrochemical oxidation and reduction of the salt of iron(III) hexacyanoferrate(II) to effect a corresponding reversible color change exhibited by the display electrode.

Electrochromic display devices using iron(III) hexacyanoferrate(II) salt

A functional electrode is disclosed which is usable as an electrochromic display electrode, as a catalytic electrode effective to catalyze the evolution of oxygen and chlorine gases and the like. The electrode is composed of a conductor and a film deposited on the surface of the conductor, the film being comprised of a compound of the formula M.sup.I M(III)[M'(II)(CN).sub.6 ] or M(III).sub.4 [M'(II)(CN).sub.6 ].sub.3 wherein M(III) is Fe(III), Ru(III) or Os(III), M'(II) is FE(II), Ru(II) or Os(II) and M.sup.I is an alkali metal cation, with the proviso that said compound does not contain both Fe(III) and Fe(II). The functional electrode is produced by electrodepositing a compound of the formula M.sup.I M(III)[M'(II)(CN.sub.6)] or M(III).sub.4 [M'(II)(CN).sub.6 ].sub.3 on a conductor, from an aqueous solution containing M(III) ions and [M'(III)(CN).sub.6 ].sup.3- ions, wherein M(III), M'(II) and M.sup.I are as already defined and M'(III) is Fe(III), Ru(III) or Os(III), with the proviso that the aqueous solution does not contain both FE(III) and [Fe(III)(CN).sub.6 ].sup.3- ions and the deposited compound does not contain both Fe(III) and Fe(II).

Functional electrode

A pattern formation with a negative type resist comprises forming a thin film made of a resist on a board and irradiating light or radiation; developing and etching the product. The resist is a diene polymer obtained by a living polymerization in the presence of an organometallic compound or a cyclic polymer thereof.

Pattern formation with negative type resist

A fine work process comprises forming a thin film made of a radiation sensitive polymer on a board; irradiating radiation; developing and etching the product. The radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR1## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.

Growing community of inventors

Sendai, Japan

Kingo Itaya