Hitachi-kokusai Electric Inc.

Teitokusha Co., Ltd.

Other

Kimio Kitamura

Kenji Tanaka

Masakazu Shimada

Akira Hayashida

Masaaki Ueno

Toshimitsu Miyata

Jyunichi Nishihara

Masashi Sugishita

Kenji Maeda

A heating apparatus comprises a heating element, an inner shell for supporting the heating element, an outer shell disposed along the outer boundary of the inner shell, a cooling medium passage for conveying a cooling medium between the inner shell and the outer shell, a first opening provided in the inner shell, a second opening provided in the outer shell, and a partition arranged to extend from the first opening to the second opening for developing at least a space separated from the cooling medium passage and between the inner shell and the outer shell. The heating apparatus further comprises an insulator for shutting up a gap provided between the partition and the second opening.

Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator

A heating apparatus comprises heating elements arranged of a sheet form and having notches or through holes provided therein, a side wall member made of an electrically conductive material and arranged to surround and define the heating space, and holding members disposed at the heating space side of the side wall member for holding at one end the heating elements. Also, extending members are provided, each member comprising an extending-through portion arranged to project from the heating space side of the side wall member and extend through the notch or through hole between both ends in the heating element and projected portions arranged to project at both, front and back, sides of the heating element from the extending-through portion in a direction, which is orthogonal to the extending direction of the extending-through portion, thus to inhibit the displacement of the heating elements along the extending direction.

Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member

A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of the reflecting members for moving the reflecting members. Moreover, pivotal members joined to the reflecting members beside more their respective other side than one side of the reflecting members for controlling as pivots the movement of the reflecting member driven by the moving unit.

Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices

A substrate treating device comprising a treatment chamber for storing and treating substrates and a heating device having a heating element and a heat insulator and heating the substrates in the treatment chamber by the heating element. The heating element is so formed that only its one end is held by a holding part, and a projection projected to the treatment chamber side at the intermediate part of the heating element and positioned in proximity to or in contact with the heating element is formed on the heat insulator. A pin with an enlarged part is passed through the heating element and the heat insulator at the intermediate part of the heating element and the enlarged part is positioned in proximity to or in contact with the heating element. The plurality of projections may be formed on the heat insulator and the pins may be disposed between these plurality of projections.

Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structure

A heater supporting structure includes heaters comprising plate-shaped electrical resistance heating elements and power applying portions for energizing the electrical resistance heating elements, mounts for mounting the electrical resistance heating elements, and first insulative supporters and second insulative supporters, the supporters being provided on the mounts with a certain distance and supporting edges of the electrical resistance heating elements, and the electrical resistance heating elements are formed in a shape so as to project toward the mounts and are provided apart from the mounts.

Growing community of inventors

Osaka, Japan

Kimio Kitamura