Dai Nippon Printing Co., Ltd.

Kimio Ito

Mitsuru Kitamura

Hiroshi Mohri

Nobuhito Toyama

Junji Fujikawa

Kazuhiro Takahashi

Shu Shimada

Tsuyoshi Amano

Yuuichi Yoshida

Shiho Sasaki

The invention provides a gradated photomask for reducing photolithography steps and its fabrication process, which make use of a generally available photomask blank, prevents the reflectance of a light shield film from growing high, makes alignment easy during the formation of a semitransparent film, and enables the semi-transparent film on a light shield pattern with good step coverage. A photomask () comprises a mixture of a light shield area including a light shield film () having a desired pattern on a transparent substrate wherein a film forming the pattern is substantially opaque to photolithographic light, a semitransparent film () that transmits the photolithographic light at a desired transmittance, and the light shield film () and the semitransparent film () are stacked on the transparent substrate () in that order; a semi-transparent area wherein there is only the semitransparent film (); and a transmissive area there is neither the light shield film () nor the semitransparent film (), and is characterized in that the semitransparent film () has an antireflection function with respect to the photolithographic light.

Gradated photomask and its fabrication process

The invention relates to a diffractive optical system having a two-dimensional structure, which can be used as a phase shift mask for the fabrication of an optical element having a two-dimensional fine periodic structure, and a two-dimensional light beam splitter. The diffractive optical systemcomprises a transparent substrate surfacethat is divided in alignment with orthogonal two directions into minuscule square cell groupsof the same shape in a checked pattern. The square cells that give a phase 2p&#x3c0; and a phase {(2q+1)&#x3c0;&#xb1;&#x3b4;&#x3c0;} where 0&#x2266;&#x3b4;&#x2266;0.25 and p and q are each an integer with respect to reference-wavelength light striking vertically on the transparent substrate surfaceare alternately arranged in each direction, and the phase 2p&#x3c0;-giving square cells and the phase {(2q+1)&#x3c0;&#xb1;&#x3b4;&#x3c0;}-giving square cells are located in such a way as to be in alignment with 45&#xb0; diagonal directions of said two directions.

Diffractive optical system

A decorative material is provided which particularly possesses excellent adhesion properties. The decorative material comprises: a substrate; a print layer provided on the substrate; a protective layer provided on the print layer, the protective layer comprising an ionizing radiation-cured resin; and a stress relaxing layer as a primer layer provided between the print layer and the protective layer, for relaxing shrinkage stress caused at the time of curing of an ionizing radiation-curable resin for the formation of the ionizing radiation-cured resin constituting the protective layer.

Decorative material

Growing community of inventors

Tokyo, Japan

Kimio Ito