Eisai Company, Limited

Kimie Takizawa

Hachiro Sugimoto

Takeru Kaneko

Satoru Ozaki

Treatment methods are disclosed which utilize antiphlogistic/antipyretic/analgesic agents containing as active ingredient theobromine and theophylline derivatives represented by the general formula: ##STR1## wherein one of A and B is --CH.sub.3 and the other of A and B is ##STR2## wherein R is a hydrogen atom or a lower alkyl group, Z is selected from the group consisting of (1) a group of the formula ##STR3## wherein X.sub.1 and X.sub.2 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom; (2) a pyridyl group; or (3) a group of the formula: ##STR4## wherein Y.sub.1 and Y.sub.2 may be the same or different and Y.sub.1 and Y.sub.2 are selected from the group consisting of a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group and a halogen atom, X is a nitrogen atom or a carbon atom, m is 2 or 3, and n is an integer of from 2 to 10, with the provisos that when (i) A is --CH.sub.3, m is 2, and (ii) when A is ##STR5## Z is not pyridyl and X is nitrogen, and acid addition salts thereof.

Antiphlogistic/antipyretic/analgesic agents containing theobromine or

Treatment methods are disclosed which utilize antiphlogistic/antipyretic/analgesic agents containing as active ingredient theobromine and theophylline derivatives represented by the general formula: ##STR1## wherein one of A and B is --CH.sub.3 and the other of A and B is ##STR2## wherein R is a hydrogen atom or a lower alkyl group, Z is selected from the group consisting of (1) a group of the formula ##STR3## wherein X.sub.1 and X.sub.2 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom; (2) a pyridyl group; or (3) a group of the formula: ##STR4## wherein Y.sub.1 and Y.sub.2 may be the same or different and Y.sub.1 and Y.sub.2 are selected from the group consisting of a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group and a halogen atom, X is a nitrogen atom or &gt;CH--, m is 2 or 3, and n is an integer of from 2 to 10, with the provisos that when (i) A is --CH.sub.3, m is 2, and (ii) when A is ##STR5## Z is not pyridyl and X is nitrogen, and acid addition salts thereof.

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Narashono, Japan

Kimie Takizawa