Lucent Technologies Inc.

Kim Willard Womack

Man Fei Yan

Katherine Theresa Nelson

David John DiGiovanni

Kenneth L Walker

Paul Francis Wysocki

Paul Francis Glodis

Stanley F Marszalek

Namkyoo Park

The deposition rate of MCVD processes is enhanced by applying at least a first and a second independently controlled heat source to a plurality of reactants which are used to form deposited particulate matter. The first heat source is adjusted so as to provide at least a specified rate of reaction for the reactants, and the second source is adjusted so as to provide at least a specified deposition rate for the particulate matter.

Modified chemical vapor deposition using independently controlled

Bubble-free core glass can be deposited at relatively high rate (e.g., &gt;0.3 gm SiO.sub.2 /minute, preferably 0.6 gm SiO.sub.2 /minute or more) by MCVD if the deposition conditions are appropriately selected. For instance, a relatively high torch traverse speed, a relatively low sintering temperature, and/or relatively low gas flow rates can facilitate high rate deposition of bubble-free glass. By way of example, conditions are disclosed that yielded essentially bubble-free core glass (.DELTA.=0.35%) at a rate of 1 gm SiO.sub.2 /minute.

High rate MCVD method of making an optical fiber preform

Multistage Er-doped fiber amplifiers (EDFAs) are disclosed. They comprise a first stage that comprises Er and Al, and further comprise a second stage that comprises Er and a further rare earth element, exemplary Yb. Such multistage EDFAs can have advantageous characteristics e.g., a relatively wide flat gain region (e.g. 1544-1562 nm), and relatively high output power, without significant degradation of the noise figure. Exemplary, the amplifiers are used in WDM systems and in analog CATV systems.

Article comprising hybrid optical fiber amplifier

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Duluth, GA, United States of America

Kim Willard Womack