Ebara Corporation

Kuraray Co., Ltd.

Hiroshima University

Tokyo Electron Limited

Other

Shimadzu Corporation

Hamamatsu-photonics K.k.

Kanomax Japan Incorporated

Kikuo Okuyama

Manabu Shimada

Toshiaki Fujii

Hideharu Iwasaki

Jun Takai

Ferry Iskandar

Tsuyoshi Moriya

Hiroyuki Nakayama

Motoaki Adachi

Naoto Kijima

Hiroshi Nagaike

Yasuo Shimomura

Shinichiro Totoki

Haruo Shimaoka

Toshihiko Hino

Akihiro Fukai

Yutaka Kaihatsu

Takashi Ogi

Yosio Ohtani

Norikazu Namiki

Akihiro Yabuki

Ilgnatius Wuled Lenggoro

Tetsuji Umebara

Michio Higuchi

Ferry Iskanda

An M-C&#x2014;N&#x2014;O based phosphor including a group IIIB element (M), carbon (C), nitrogen (O), wherein an amount of the group IIIB element (M) contained is 1%&#x3c;(M)&#x3c;50% by mass, an amount of carbon (C) contained is 0.005%&#x3c;(C)&#x3c;10% by mass, an amount of nitrogen (N) contained is 1%&#x3c;(N)&#x3c;60% by mass, an amount of oxygen (O) contained is 1%&#x3c;(O)&#x3c;75% by mass, and (M)+(C)+(N)+(O)=100% by mass. Colors of the M-C&#x2014;N&#x2014;O based phosphor can be changed by adjusting a peak top of an emission spectrum. Highly environmentally-compatible polymer dispersions, inorganic EL devices, light emitting devices, fluorescent tubes, and the like are also provided, which use the M-C&#x2014;N&#x2014;O based phosphors.

M-C-N-O based phosphor

The present invention provides an Al&#x2014;C&#x2014;O based phosphor using neither heavy metal nor rare metal and composed of elements with high environmental compatibility and excellent economic efficiency, wherein the wavelength of the peak intensity of the emission spectrum can be changed without changing the basic composition. An aluminum oxide phosphor which comprises aluminum (Al), carbon (C), and oxygen (O) respectively in an amount of 30 mol %&#x3c;Al&#x3c;60 mol %, 0 mol %&#x3c;C&#x3c;10 mol %, 30 mol %&#x3c;O&#x3c;70 mol % is provided. The above problem is solved in the production of an Al&#x2014;C&#x2014;O phosphor comprising aluminum (Al), carbon (C), and oxygen (O) by heating and firing a mixture comprising an aluminum-containing compound and a coordinatable oxygen-containing compound.

Aluminum oxide phosphor and method for producing the same

A method of producing an M-C-N-O based phosphor with reduced non-uniform emission and improved color purity is provided. The method of producing an M-C-N-O based phosphor comprising a group IIIB element (M), carbon (C), nitrogen (N) and oxygen (O) comprises: heating a mixture comprising a group IIIB element-containing compound and a nitrogen-containing organic compound to form a pyrolysate; disintegrating the resulting pyrolysate-containing product; and firing the disintegrated product.

Method of producing M-C-N-O based phosphor

A substrate transfer mechanism for transferring a substrate includes a mounting table on which the substrate is mounted; an arm member connected to the mounting table and moving it. The substrate transfer mechanism further includes a temperature control unit for controlling temperature of the mounting table, wherein the temperature control unit forms a temperature gradient in the mounting table. The temperature control unit includes a detector for detecting temperature in an environment or a chamber in which the substrate transfer mechanism is installed a heater for heating the mounting table and a controller for controlling an operation of the heater based on the temperature in the environment or the chamber detected by the detector.

Particle removal method for a substrate transfer mechanism and apparatus

An X-ray emitting sectionfor emitting soft X-ray is arranged facing a chamber. An inlet ductand a outlet ductare arranged on both sides of the chamber. An irradiating region is ionized by the soft X-ray. It is therefore possible to achieve a charging device of aerosol particles that is safe and easy to handle.

Aerosol particle charging device

A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control unit controls the temperature of the gas based on a temperature gradient between the temperatures of the inner wall and the gas or a temperature gradient between the temperatures of the processing unit and the gas. A method for removing particles from a processing apparatus includes a first detection step for detecting a temperature of an inner wall of the vacuum vessel, a second detection step for detecting a temperature of the processing unit, a first control step for controlling a temperature of the gas, and a gas introduction step for introducing the gas into the inner space of the vacuum vessel.

Processing apparatus and method for removing particles therefrom

A process for producing fine phosphor particles having a high crystallinity, having a small amount of aggregated particles and comprising fine particles, thus capable of forming a homogeneous and dense high brightness fluorescent layer when applied to e.g. a cathode ray tube, a fluorescent lamp or PDP, and having a high purity, a uniform chemical composition and excellent emission properties, at a low cost, is provided. A process for producing a phosphor, which comprises heating droplets of a solution containing metal elements constituting the phosphor to carry out pyrolysis to obtain the phosphor, wherein the above heating is carried out in the coexistence of an additive comprising a metal or a metal compound to carry out the pyrolysis at an average crystal growth rate of at least 0.002 &mgr;m /sec.

Phosphor and its production process

Suspended particulate matter in the atmospheric air is sucked into a container by a pump. The suspended particulate matter in the atmospheric air in the container is electrically charged so as to electrically collect it. The collected suspended particulate matter is irradiated with laser beams under the condition that the collected suspended particulate matter is dispersed at an appropriate concentration. A spatial intensity distribution of diffracted and scattered light obtained by irradiating laser beams to the suspended particulate matter is measured. A particle size distribution of the suspended particulate matter P is found from the result of measurement.

Method and apparatus for measuring suspended particulate matter

A method an apparatus for chemical vapor deposition for producing a thin film. The method includes the steps of: introducing a reactive gas into a reaction chamber wherein a substrate is supported in the reaction chamber; combining charged particles with a component of the reactive gas for ionizing the component; and electrostatically depositing the ionized component onto the substrate in an electric field. Charged particles may be photoelectrons or positive or negative ions produced by discharge. The reactive gas may be solely an ingredient gas containing a component for a thin film or a mixture of the ingredient gas and an oxidizing or reducing gas. The apparatus includes a reaction chamber including a support for a substrate, a device for introducing a reactive gas into the reaction chamber, an electric discharge device, and a device for forming an electric field in the reaction chamber in a direction to the support for the substrate, and an outlet for discharging the reactive gas.

Chemical vapor deposition method and chemical vapor deposition apparatus

A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

Method for removing particles from surface of article

A method for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

Method for removing particles from a surface of an article

An apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.

Growing community of inventors

Higashihiroshima, Japan

Kikuo Okuyama