Sony Corporation

Sony Chemical & Information Device Corporation

Sony Disc & Digital Solutions Inc.

Kiichiro Oguni

Kozaburo Hayashi

Satoshi Yanagida

Hidetoshi Watanabe

Naoki Okawa

A solvent-free photocurable resin composition is provided which can be applied to the surface of optical discs or the like to form a highly transparent protective film that can stably adhere to the surface and effectively protect the surface from scratches. The solvent-free photocurable resin composition contains a urethane(meth)acrylate oligomer, a trifunctional (meth)acrylic acid ester monomer, a photopolymerization initiator, and a dilution monomer. The dilution monomer contains a fluorine-based (meth)acrylic acid ester monomer having three or more fluorine atoms and a monofunctional or difunctional (meth)acrylic acid ester monomer in amounts of from 10 to 40 wt% and from 10 to 30 wt%, respectively.

Solvent-free photocurable resin composition for protective film

Compositions for protective films include inorganic microparticles dispersed in an acrylic radical-based binder resin. Binder resins are formed from binder monomers including base components, scratch-resistant components and diluent components. Diluent components include diluent monomers having principal chain structures including a functional group having a cyclic structure or a branched carbon chain structure.

Compositions for protective films for optical discs

Compositions for protective films for optical disc are provided. Compositions for protective films, particularly compositions for protective films for optical discs having low viscosity and low shrinkage without compromising scratch resistance even when a dilution solvent is not used. The compositions for protective films for optical discs include a composition for protective films containing a UV-curable acrylic radical-based resin as the main component including a multifunctional acrylic monomer, a multifunctional acrylic oligomer and a bifunctional acrylic monomer containing repeating units including at least one of an ethoxy and propoxy group as starting materials for the acrylic radical-based resin; and a photoinitiator.

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Tochigi, Japan

Kiichiro Oguni