Fujifilm Corporation

Fuji Photo Film Company, Limited

Fujinon Corporation

Namiki Seimitsu Houseki Kabushiki Kaisha

Kiichi Kato

Yoshinori Morimoto

Kenji Matsumoto

Toshiro Hayakawa

Masami Hatori

Yoji Okazaki

Masahiro Saito

Ryoichi Yamamoto

Takashi Yamada

Katsuto Sumi

Hisashi Ohtsuka

Yuichi Teramura

Hidetoshi Shinada

Shizuo Umemura

Hiroshi Yamazaki

In the optical tomographic imaging apparatus according to an aspect of the present invention, since a stable light intensity can be secured for a reflected light beam of a measurement light beam reflected off of a transmitting surface of a probe outer casing as a returning light beam to an optical fiber, the optical path length difference between a reference light beam and the measurement light beam can be precisely adjusted by adjusting the optical path length of the reference light beam with an optical path length adjusting device. In addition, a signal of a measurement object can be reliably detected from a detection signal of an interference light beam detected by an interference light detecting device.

Optical tomographic imaging apparatus including a beam scattering structure

An OCT probe has a sheath to be inserted into a subject; and an optical system within the sheath, for changing the direction of light which propagates from a light source through an optical fiber to irradiate the light onto the subject through a transparent portion of the sheath, and for reflecting the light beam, which is reflected by the subject, to guide the light into the optical fiber. A light output surface, for causing the light to be output from the reflecting surface in a direction obliquely inclined with respect to the inner surface of the sheath, and a reflected light sheath entrance preventing portion, for preventing light reflected by the inner surface of the sheath from entering the optical fiber, are provided in the optical system. The reflected light sheath entrance preventing portion may be formed by providing a cut planar surface portion on the lens.

OCT probe for eliminating ghost images

A polarization maintaining optical fiber, for guiding a measuring light beam, is provided within a probe. The probe is configured to be rotatable in the circumferential direction of the polarization maintaining optical fiber. A polarization direction rotator, for rotating the polarization direction of the measuring light beam that enters the polarization maintaining optical fiber accompanying rotation of the probe, is provided in order to maintain a state in which the polarization direction of the measuring light beam that enters the polarization maintaining optical fiber and the direction of the polarization axis of the polarization maintaining optical fiber are matched.

Optical coherence tomography system

Light emitted from the light source unit divided into measuring light and reference light. An optical path length of the measuring light or the reference light is adjusted and a probe guides the measuring light to an object. The reflected light from the object when the measuring light is projected onto the object and the reference light are multiplexed. Interference light of the reflected light and the reference light which have been multiplexed is detected, and a tomographic image of the object is obtained on the basis of the interference light. The probe is provided with a distance measuring circuit for measuring the distance from the probe to the object, and the optical path length of the measuring light or the reference light is adjusted by the use of the distance to the object measured by the distance measuring circuit to adjust the tomographic image obtainment initiating position.

Optical tomography system

When a tomographic image of an object in a body cavity is to be obtained by an optical coherence tomography measurement employing a probe, the distance between the probe and the object is measured and the optical path length of the measuring light or the reference light is adjusted.

A light source apparatus is equipped with at least three light sources each having a predetermined wavelength interval and different central wavelengths. At least one multiplexing means having wavelength selectivity, for multiplexing light emitted from each of a first group and a second group of the light sources is provided, the first group of light sources including odd ordered light sources and the second group of light sources including even ordered light sources when counted in order of lengths of the central wavelengths thereof. Multiplexing means not having wavelength selectivity, for multiplexing light emitted from the first group of light sources and the second group of light sources is also provided.

Light source apparatus and optical tomography imaging apparatus

An optical system includes semiconductor lasers arranged in the direction of the slow axis of the laser beam, an optical means which makes parallel the collimated laser beams, an optical member which is provided with inlet and outlet faces which are positioned in perpendicular to the optical axis of laser beams and total reflection surfaces which are opposed to each other at a space where the component in the direction of the slow axis of the laser beam entering from the light inlet face repeats internal reflection, and emits from the light outlet face a slow axis uniform laser beam, and an imaging optical means which images the slow axis uniform laser beam on a surface as a linear line beam extending in the direction of the slow axis.

Linear light beam generating optical system

When a ratio R between a total angle &#x3c6; of a widening angle in a median intensity of light of a light source (a GaN based semiconductor laser) and a total angle 2/&#x3c6; of a widening angle of light defining a numerical aperture NA of a collimator optical system (collimator lens) is defined as R=(sinNA)&#xd7;2/&#x3c6;, the numerical aperture of the collimator optical system (collimator lens) is set so that 2.0&#x2267;R&#x2267;0.58. Thus, an image exposure device is provided that can suppress stray light of a light source that emits a large amount of stray light.

Image exposure device and laser exposure device applied thereto

In an image exposing apparatus and an image exposing method, a deterioration of an image quality caused by stray light is suppressed, while both a sensitive level and a non-sensitive level are properly set in accordance with a type of photosensitive material. In the image exposing apparatus, a recording level setting unit calculates a recording level corresponding to a light amount level stored in a recording level light amount memory and sets the calculated recording level. A non-recording level setting unit calculates a non-recording level from an extinction ratio, which corresponds to a type of photosensitive material stored in a photosensitive material information memory, and the recording level. An output voltage setting unit sets an output voltage such that a detected voltage becomes equal to one of the recording level and the non-recording level.

Image exposing apparatus and image exposing method

A semiconductor laser pumped solid state laser includes a solid laser medium, a semiconductor laser which radiates a pumping laser beam for pumping the solid laser medium, and a light entrance optical system which converges the pumping laser beam in the solid laser medium. The semiconductor laser is disposed with its beam radiating axis inclined to the optical axis of the light entrance optical system so that the pumping laser beam travelling from the semiconductor laser to the solid laser medium and a laser beam reflected at the pumping light inlet side end face of the solid laser medium travel different optical paths. A light-shielding plate which intercepts the laser beam reflected at the pumping light inlet side end face of the solid laser medium is provided between the semiconductor laser and the solid laser medium.

Semiconductor laser pumped solid state laser

An optical element consists of an LN or LT crystal doped with MgO or ZnO. A +z surface and a -z surface of the crystal are connected to each other by means of a metal jig and an indium sheet. The +z surface and the -z surface may also be connected to each other by means of an electrically conductive wire material. The optical element may be a bulk crystal, an optical waveguide type electro-optical modulator, or a bifurcated interference type optical modulator. In this way, an optical damage resistant property of the optical element is improved.

Optical element

A light beam recording device. A light beam irradiated from a light beam irradiating device is scanned onto an object to be illuminated, which is provided in a vicinity of a focal position, while being focused by a scanning optical system. A converging member is disposed on an optical path between the light beam irradiating device and the scanning optical system, and converges a light beam which is incident on the converging member. An optical path changing device is disposed in a vicinity of a converging position of a light beam which is converged by the converging member, and changes an optical path of the light beam.

Light beam recording device having a reflecting mirror movable a long an

A magneto-optical recording medium comprises a substrate and a magneto-optical recording film overlaid on the substrate. The magneto-optical recording film is composed of a first protective dielectric layer, a recording layer, a second protective dielectric layer, and a reflection metal layer, which layers are overlaid in this order on the substrate. The thickness of the first protective dielectric layer falls within the range of 950 .ANG. to 1,300 .ANG.. The thickness of the recording layer falls within the range of 200 .ANG. to 400 .ANG.. The thickness of the second protective dielectric layer falls within the range of 100 .ANG. to 600 .ANG.. The thickness of the reflection metal layer falls within the range of 200 .ANG. to 800 .ANG..

Growing community of inventors

Kanagawa-ken, Japan

Kiichi Kato