Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Samsung Sdi Co., Inc.

Ki-Yong Song

Kwang-sub Yoon

Jae-Hong Kim

Sang-jun Choi

Ki-Yeup Lee

Yu-Gwang Jeong

Sang-Gab Kim

Sang-Gyun Woo

Shin-Il Choi

Joo-han Kim

Ji-Young Park

Hee-Joon Kim

Dong-Ju Yang

Chang-Hoon Kim

Yeo-Geon Yoon

Yun-Jong Yeo

Sung-Hen Cho

Yong-Hwan Kim

Yoon-Ho Kang

Sang-gyun Woo

Sang-Cheol Park

Chang-ho Noh

Jung-Gyu Nam

Joo-Tae Moon

A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.

Contact portion of wire and manufacturing method thereof

A photoacceptive layer having a core-shell structure and a solar cell using the same are provided. More specifically, a photoacceptive layer including a metal oxide of a core-shell structure which can improve photoconversion efficiency by improving a electron migration path, and a solar cell using the same are provided.

Photoreceptive layer comprising metal oxide of core-shell structure and solar cell using the same

The present invention relates to a liquid crystal display, wherein arrangement of liquid crystal molecules thereof is controlled by using a monomer that is polymerized by ultraviolet rays to provide a pre-tilt. To prevent damage to organic material layers when irradiating ultraviolet rays to the monomer, a blocking film made of an ultraviolet absorbing agent is formed on or over at least one such layer.

Liquid crystal display and manufacturing method thereof

Disclosed is a photosensitive polymer comprising pentafluoromethylvinyl ether derivative monomer having the formula: wherein R may be an alkoxy carbonyl, alkylsilane, a fluorine-substituted or unsubstituted C&#x2013;Calkyl carbonyl, a fluorine-substituted or unsubstituted C&#x2013;Ccycloalkylcarbonyl or a fluorine-substituted or unsubstituted benzoyl substituent group. The photosensitive polymer is the polymerization product of the pentafluoromethylvinyl ether derivative monomer and at least one additional monomer selected from the group consisting of (meth)acrylic acid, (meth)acrylate, styrene, norbornene, tetrafluoroethylene and maleic anhydride monomers. The photosensitive polymer may be used in photoresist compositions for exposure light sources having a predominant wavelength of less than 157 nm.

Photosensitive polymer including fluorine and resist composition containing the same

A photosensitive polymer including fluorine, a resist composition containing the same and a patterning method for IC fabrication using the resist composition are provided. The photosensitive polymer having at least one selected from the group consisting of fluorine-substituted or unsubstituted alkyl ester, tetrahydropyranyl ester, tetrahydrofuranyl ester, nitrile, amide, carbonyl and hexafluoro alkyl having a hydrophilic group, and a trifluorovinyl derivative monomer as a repeating unit and having a weight average molecular weight of about 3,000 to about 100,000. The photosensitive polymer exhibits high transmittance for a light source of F(157 nm), high dry etching resistance, and has characteristics suitable to realize an unitrafine pattern size.

Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition

A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows:

Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same

Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer. The photosensitive polymer has an average molecular weight of about 3,000-100,000 with a repeating unit including a group having one of structural formulae below:

Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same

Growing community of inventors

Seoul, South Korea

Ki-Yong Song