Dongjin Semichem Co., Ltd.

Lg Display Co., Ltd.

Ki-Beom Lee

Byung-Uk Kim

Mi-Sun Park

Jin-Wuk Kim

Jong-Min Kim

Soon-Sung Yoo

Byung-Geol Kim

Sung-Hee Kim

Byong-Hoo Kim

Myoung-Soo Lee

Seung-Hyup Shin

Wy-Yong Kim

Chang-Il Oh

Jun-Yong Song

Min-Gun Lee

Jun-Youg Song

Yong-Woo Kim

Jin-Sup Hong

Jae-Ku Lee

Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250&#xb0; C.

Ink composition for imprint lithography and roll printing

Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250&#xb0; C.

Ink composition and method of fabricating liquid crystal display device using the same

A system for testing a flat panel display having a flat display panel assembly includes a testing stage for arranging the flat display panel assembly, a measuring apparatus being disposed on the testing stage and for measuring a spectrum of a transmitted light passing through a measuring region of the flat display panel assembly from a light source, a transporting apparatus for moving the measuring apparatus at a constant acceleration on the testing stage, a defect informing apparatus being electrically connected to the measuring apparatus and for informing an existence of defect, a type of defect, and a severity of defect by processing an electrical signal of the spectrum transmitted from the measuring apparatus.

System for testing a flat panel display device and method thereof

A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.

System and method for controlling composition for lithography process in real time using near infrared spectrometer

In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.

Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer

Growing community of inventors

Gyeonggi-do, South Korea

Ki-Beom Lee