Vestas Wind Systems A/s

Tech Semiconductor Singapore Pte Ltd

Khoon Peng Lim

Yu Zhou

Pey Yen Siew

Tie Ling Zhang

Wan Chen

Jiun Keat Ong

Kiran Kishan Rao Nandedkar

Bung Chai Chin

Jiann Yi Ho

Wanying Chen

Srikanth Narasimalu

Amit Kalyani

K J Karthik

Lai Seng Foo

Kok Eng Lee

Karthik Kj

Karthik KJ

Wan Ying Chen

A method for performing condition monitoring on a plurality of wind turbines of a wind farm comprises for each wind turbine, obtaining at least one vibration signal representing vibrations of one or more monitored components; generating a plurality of faulty frequency indexes on the basis of one or more of the obtained vibration signals, and in such a manner that variations in rotational speed of one or more rotating shafts of the wind turbine are filtered; comparing faulty frequency indexes originating from different wind turbines; and determining the condition of each of the monitored components based on the comparison.

Method for performing condition monitoring in a wind farm

The present invention relates to a method of controlling a wind turbine having at least one blade and a controller, including: detect location of foreign material adhered to the blade by sensors mounted on the blade and communicatively coupled to the controller; determine the resonance mode of the blade to be excited based on the location of the foreign material by the controller; and excite the blade to the resonance mode; wherein the resonance mode is one higher than the first order resonance mode. The present invention also relates to a wind turbine using the method.

Method of controlling a wind turbine, and a wind turbine

A method and a system for controlling operation of a wind turbine are provided. The method includes determining at least one failure mode relating to one or more components of the wind turbine, estimating a remaining lifetime of the component under current operating conditions, determining one or more control schemes to control the operation of the wind turbine in order to adjust the remaining lifetime of the component to a desired remaining lifetime of the component, determining a power production yield for the determined one or more control schemes and selecting a determined control scheme for controlling the operation of the wind turbine that maximizes the power production yield.

Method and a system for controlling operation of a wind turbine

Methods and systems for controlling operation of a wind turbine. The method may comprise determining an alarm level for at least one component of the wind turbine. In the case that an alarm level for at least one component exceeds a predefined level, the method comprises estimating an expected remaining lifetime for the component under the current operating conditions, and controlling operation of the wind turbine in order to adjust the expected remaining lifetime for the component to a desired expected remaining lifetime for said component. Thereby, the expected remaining lifetime for the component can be prolonged until the next scheduled service event. Downtime of the wind turbine is considerably reduced, and unscheduled service events are avoided to the greatest possible extent. Mean time between inspections (MTBI) is also extended.

Method and system for controlling operation of a wind turbine

A method for controlling the operation of a wind turbine includes determining a first measure of a mechanical input of a component of the wind turbine, and concurrently, determining a second measure of a mechanical output of the component, determining an operating frequency response function of the component from an analysis of the relation between the first measure and the second measure, comparing the operating frequency response function with a predetermined operating frequency response function and determining a possible deviation between the two, and controlling the operation of the wind turbine so as to alter the mechanical input to the component in response to the deviation. A wind turbine that implements such a method is also disclosed.

Method for controlling the operation of a wind turbine based on deviation between operating and predetermined frequency response functions

Methods and systems for detecting wafer shift/slide in a semiconductor process chamber have been disclosed. The vibration amplitude is measured in terms of acceleration because an increase in vibrational acceleration correlates with an increase of displacement of a wafer. The vibration of a chamber is measured. External vibratory forces acting on the chamber may be transmitted to the wafer inside the chamber. The methods/systems determine if there is a net resultant force that may cause an unconstrained wafer to move from its original position in a chamber by measuring the relative chamber vibrations in three orthogonal directions. A tri-axial or three uni-axial accelerometers are mounted on a preferably exterior wall of the chamber to measure its vibration amplitude. The signal obtained as a function of time is then compared against a predetermined alarm amplitude to provide notification for corrective action.

Real-time detection of wafer shift/slide in a chamber

An apparatus and method for use is described which permits real time monitoring of build-up of particulate contamination in a wafer processing chamber. The apparatus is capable of monitoring particle build up in regions of a processing chamber which are not accessible by traditional optical particle scanners. An accelerometer is fastened to a body in the chamber upon which particulates deposit. The body is subjected to vibrations and produces a vibration signal which is detected by the accelerometer. The signal is processed to form a frequency spectrum of vibration amplitudes. Frequencies in a selected band are directly proportional to the particulate build up on the body. The invention is applied to a wafer annealing tool with a rotatable platform wherein particles deposit on a support body under the wafer. The method and apparatus have been shown to be reliable and accurate as well as cost effective and easily implemented.

Real time monitoring of particulate contamination in a wafer processing chamber

CMP pad conditioning processes have been monitored and controlled by detecting the vibrational spectrum of a sensor mounted on the conditioner support arm. An accelerometer is used as the detector so that vibrational velocity (which correlates with pad wear) can be measured, rather than displacement or acceleration. After the vibrational spectrum has been transformed to its frequency domain equivalent, it is monitored for the presence of abnormal peaks in order to control the conditioning process.

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Singapore, Singapore

Khoon Peng Lim