Asml Netherlands B.v.

Amsl Netherlands B.v.

Khalid Manssouri

Ramidin Izair Kamidi

Dirk-Jan Bijvoet

Youssef Karel Maria De Vos

Wilhelmus Henricus Theodorus Maria Aangenent

Ronald Casper Kunst

Marinus Maria Johannes Van De Wal

A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.

Lithographic apparatus, substrate support system, device manufacturing method and control program

A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.

Servo control system, lithographic apparatus and control method

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Eindhoven, Netherlands

Khalid Manssouri