Asml Netherlands B.v.

Cymer, Inc.

Kevin Weimin Zhang

Alexander Anthony Schafgans

Richard L Sandstrom

Robert Jay Rafac

Daniel J W Brown

Jan Bernard Plechelmus Van Schoot

Markus Franciscus Antonius Eurlings

Antonius Johannes Josephus Van Dijsseldonk

Matthew Graham

Oscar Franciscus Jozephus Noordman

Robert P Akins

Michael Anthony Purvis

Niek Antonius Jacobus Maria Kleemans

Ramon Mark Hofstra

Christo Liebenberg

Patrick L Nelissen

Tien Nang Pham

Jiun-Cheng Wang

A faceted reflector (&#x2033;) for receiving an incident radiation beam () and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Radiation source

A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.

Variable radius mirror dichroic beam splitter module for extreme ultraviolet source

An extreme ultraviolet light system includes an optical amplifier system and a catalytic conversion system. Each optical amplifier of the optical amplifier system includes a gain medium in the form of a gas mixture that produces an amplified light beam. The optical amplifier system includes a fluid input and a fluid output through which the gas mixture flows. The catalytic conversion system is fluidly connected to the fluid output of the optical amplifier system and to the fluid input of the optical amplifier system. The catalytic conversion system includes a catalytic converter that includes a housing; a substrate within the housing including openings through which the gas mixture can flow; and a catalyst applied as a coating to the interior surfaces of the openings of the substrate, the catalyst including particles of metal. The particles of metal can be nanoparticles of precious metal.

Catalytic conversion of an optical amplifier gas medium

A laser light source experiencing an EOL condition, which might otherwise cause an unscheduled shutdown, is instead operated in a diminished capacity in one or more predetermined or calculated increments. Operating in such diminished capacity continues until the laser system can undergo appropriate maintenance either during a regularly scheduled shutdown or a newly scheduled shutdown. In the meantime, the diminished capacity of the laser system is accommodated by the utilization tool, as appropriate.

Method and system for managing light source operation

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San Diego, CA, United States of America

Kevin Weimin Zhang